印制电路信息
印製電路信息
인제전로신식
PRINTED CIRCUIT INFORMATION
2014年
5期
44-47
,共4页
纳米钯%印制电路板%化学镀铜%制备%活化液
納米鈀%印製電路闆%化學鍍銅%製備%活化液
납미파%인제전로판%화학도동%제비%활화액
Nano-Palladium%PCB%Electroless Copper Plating%Preparation%Activation Solution
以二水合氯化钯为原料,PVP(聚乙烯吡咯烷酮)为分散剂,抗坏血酸(AA)为还原剂,在常温下还原Pd2+制备纳米钯。通过激光动态散射法(DSL),透射电子显微镜(TEM)和X射线衍射仪(XRD)对纳米钯进行了表征分析,结果显示,在PVP分散剂的作用下,得到的纳米钯为粒径8 nm~22 nm,无其他的氧化物存在。该纳米钯材料可作为化学沉铜的活化液,可以减少沉铜的工艺步骤,经过金相显微镜观测化学镀铜后的孔背光级数均达到10级,通过扫描电镜观察镀铜层表面颗粒均匀、平整。所制备的纳米钯是一种优异的化学镀铜活化剂。
以二水閤氯化鈀為原料,PVP(聚乙烯吡咯烷酮)為分散劑,抗壞血痠(AA)為還原劑,在常溫下還原Pd2+製備納米鈀。通過激光動態散射法(DSL),透射電子顯微鏡(TEM)和X射線衍射儀(XRD)對納米鈀進行瞭錶徵分析,結果顯示,在PVP分散劑的作用下,得到的納米鈀為粒徑8 nm~22 nm,無其他的氧化物存在。該納米鈀材料可作為化學沉銅的活化液,可以減少沉銅的工藝步驟,經過金相顯微鏡觀測化學鍍銅後的孔揹光級數均達到10級,通過掃描電鏡觀察鍍銅層錶麵顆粒均勻、平整。所製備的納米鈀是一種優異的化學鍍銅活化劑。
이이수합록화파위원료,PVP(취을희필각완동)위분산제,항배혈산(AA)위환원제,재상온하환원Pd2+제비납미파。통과격광동태산사법(DSL),투사전자현미경(TEM)화X사선연사의(XRD)대납미파진행료표정분석,결과현시,재PVP분산제적작용하,득도적납미파위립경8 nm~22 nm,무기타적양화물존재。해납미파재료가작위화학침동적활화액,가이감소침동적공예보취,경과금상현미경관측화학도동후적공배광급수균체도10급,통과소묘전경관찰도동층표면과립균균、평정。소제비적납미파시일충우이적화학도동활화제。
A nano-palladium activator was successfully prepared at room temperature by the reaction of palladium chloride with dispersing agent PVP (polyvinylpyrrolidone) and reducing agent ascorbic acid (AA). Dynamic laser scattering (DLS), transmission electron microscopy (TEM) and X-ray diffraction (XRD) were used to characterize the nano-palladium. It showed that the obtained nano-palladium was diameter 10~20 nm due to the dispersant effect of PVP. And palladium oxide did not exist in it. The nano-palladium materials that can be used as the activation of electroless copper solution. And nano-palladium activation (catalyst) solution can reduce PTH technology. It had excellent back light up to 10 by the optical microscope observation after electroless copper plating in the plated through hole. The surface was uniform particles, coating lfat and smooth by using scanning electron microscopy (SEM) to characterize of the surface copper layer. The preparation nano palladium copper sink was an excellent activation solution.