CAJ | 학술논문

介绍纳米压印光刻技术的研究现状和发展状况，分析常用的热压印（ Hot Emboss-ing Lithography，HEL）、紫外固化压印（Ultra Violet Nanoimprint Lithography，UV-NIL）及微接触压印（ Micro Contact Printing ，μ-CP）三种光刻的工艺过程。探讨纳米压印光刻方法的优缺点及影响压印图形质量的主要因素，旨在加深对纳米压印光刻工艺过程（模具制作、压印过程及图形转移）深层次的理解和认识，从而解决纳米压印光刻过程中存在的一些关键问题，为新型纳米压印技术的研究和发展提供必要的科学依据。
개소납미압인광각기술적연구현상화발전상황，분석상용적열압인（ Hot Emboss-ing Lithography，HEL）、자외고화압인（Ultra Violet Nanoimprint Lithography，UV-NIL）급미접촉압인（ Micro Contact Printing ，μ-CP）삼충광각적공예과정。탐토납미압인광각방법적우결점급영향압인도형질량적주요인소，지재가심대납미압인광각공예과정（모구제작、압인과정급도형전이）심층차적리해화인식，종이해결납미압인광각과정중존재적일사관건문제，위신형납미압인기술적연구화발전제공필요적과학의거。
This paper introduces the research and development of nanoimprint lithography technology and analyzes the three common lithography processes , hot press printing ( Hot embossing lithography , HEL) , UV curing stamping ( Ultra violet nanoimprint lithography , UV-NIL) and Micro Contact stamping ( Micro Con-tact printing ,μ-CP) .For getting better quality , the method and main factors of nanoimprint lithography pat-tern are discussed , for the purpose of deepening the understanding of the nanoimprint lithography process ( mould fabrication , stamping process and pattern transfer ) , solving some key problems of the nanoimprint li-thography process , and providing the necessary scientific basis for research and development the new nanoim-print lithography technology .