模拟分析SiH4和N2O产生等离子体加强化学沉积制备SiO2薄膜
모의분석SiH4화N2O산생등리자체가강화학침적제비SiO2박막
Particle simulation analysis of SiH4 and N2O produced plasma enhanced chemical vapor deposition (PECVD)
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