光电工程
光電工程
광전공정
OPTO-ELECTRONIC ENGINEERING
2013年
7期
39-43
,共5页
光学器件%光刻投影物镜%支撑结构%结构优化%有限元
光學器件%光刻投影物鏡%支撐結構%結構優化%有限元
광학기건%광각투영물경%지탱결구%결구우화%유한원
optics device%lithography objective%supporting structure%structure optimization%finite element
光刻投影物镜的透镜支撑形式决定透镜的面形精度，进而影响光学系统的成像质量。本设计为实现透镜面形精度优于5 nm的RMS值，提出一种三点挠性主支撑和六点弹片辅助支撑的支撑形式。综合考虑透镜自重、夹持力和热载荷对透镜面形影响，对支撑结构进行优化设计，并进行了仿真分析。仿真后的面形结果为：上表面面形PV 21.7 nm，RMS 4.49 nm；下表面面形PV 81.3 nm，RMS 3.63 nm。仿真结果显示：该种透镜的支撑结构可以满足光刻投影物镜的高精度面形指标要求。
光刻投影物鏡的透鏡支撐形式決定透鏡的麵形精度，進而影響光學繫統的成像質量。本設計為實現透鏡麵形精度優于5 nm的RMS值，提齣一種三點撓性主支撐和六點彈片輔助支撐的支撐形式。綜閤攷慮透鏡自重、夾持力和熱載荷對透鏡麵形影響，對支撐結構進行優化設計，併進行瞭倣真分析。倣真後的麵形結果為：上錶麵麵形PV 21.7 nm，RMS 4.49 nm；下錶麵麵形PV 81.3 nm，RMS 3.63 nm。倣真結果顯示：該種透鏡的支撐結構可以滿足光刻投影物鏡的高精度麵形指標要求。
광각투영물경적투경지탱형식결정투경적면형정도，진이영향광학계통적성상질량。본설계위실현투경면형정도우우5 nm적RMS치，제출일충삼점뇨성주지탱화륙점탄편보조지탱적지탱형식。종합고필투경자중、협지력화열재하대투경면형영향，대지탱결구진행우화설계，병진행료방진분석。방진후적면형결과위：상표면면형PV 21.7 nm，RMS 4.49 nm；하표면면형PV 81.3 nm，RMS 3.63 nm。방진결과현시：해충투경적지탱결구가이만족광각투영물경적고정도면형지표요구。
The surface figure precision of lens is decided by the supporting form in lithography objective lens, which influences the performance of optics system further. In order to reach the requirement of lens figure precision, which is better than 5nm RMS, this article introduces a lens supporting structure. The structure includes three points main flexible supporting and six points aided spring supporting. Optimization and analysis to the structure has been done for considering the influence of gravity, clamping force and thermal on figure precision. The conclusion is that PV of upper surface figure is 21.7 nm, RMS is 4.49 nm, PV of lower surface figure is 81.3 nm and RMS is 3.63 nm. The supporting structure satisfies the requirement of high precision figure in lithography objective lens.
