CAJ | 학술논문

在高真空状态下采用孔径为40 nm的超薄阳极氧化铝（ AAO）模板作为掩膜进行金的热蒸镀，制备了平均粒径为35.5 nm、填充密度为1.45×1010 cm-2的金纳米点阵列．探索了高密度有序纳米点阵列的制备工艺．通过扫描电子显微镜（SEM）和原子力显微镜（AFM）对金纳米点阵列进行表面形貌表征，证明超薄AAO模板法明显改善了金纳米点阵列分布的尺寸均匀度和有序度．
재고진공상태하채용공경위40 nm적초박양겁양화려（ AAO）모판작위엄막진행금적열증도，제비료평균립경위35.5 nm、전충밀도위1.45×1010 cm-2적금납미점진렬．탐색료고밀도유서납미점진렬적제비공예．통과소묘전자현미경（SEM）화원자력현미경（AFM）대금납미점진렬진행표면형모표정，증명초박AAO모판법명현개선료금납미점진렬분포적척촌균균도화유서도．
High-density Au nanodot arrays have attracted a lot of interests because of their potential applications in catalyst and biosensor .This article focused on the research of the manufacture of high-density and well-ordered Au nanodot arrays with size of 40 nm ultra-thin Anodic Aluminum Oxide ( AAO) membrane ( the result of our experi-mental exploration ) being the mask .Well-ordered Au nanodot arrays have fabricated by high-vacuum Au thermal e-vaporation with the help of AAO masks bonded on the desired substrates .The diameters of Au nanodots have been highly controlled with 35.5 nm, the packing-density could achieve to as high as 1.45 ×1010 cm-2 .The morphology of the Au nanodot arrays has been investigated by the SEM and AFM .The SEM images confirmed that the uniformi-ty of the size distribution and structural ordering of Au nanodot arrays had been improved by the two -step anodiza-tion of AAO.