CAJ | 학술논문

采用磁控溅射法，以不同的B靶功率(分别为24，30，60，90和120 W)，在单晶硅(100)和不锈钢基底上制备一系列不同B含量的ZrBN复合膜，利用扫描电镜、能谱仪、X射线衍射仪、纳米压痕仪(CSM)和摩擦磨损试验机研究B靶功率对ZrBN复合膜的微结构、力学性能、以及室温和高温摩擦性能的影响。结果表明：当B靶功率低于30 W时，复合膜呈fcc ZrBN结构；当B靶功率高于30 W时，复合膜为fcc ZrBN和hcp ZrB2双相结构。当B靶功率为24 W时，复合膜的硬度和室温摩擦因数分别为29.3 GPa和0.75，随B靶功率增大，硬度和室温摩擦因数都逐渐减小。B靶功率为24 W时制备的ZrBN复合膜的摩擦因数随温度升高先减小后增大。同时，对ZrBN复合膜的摩擦机理进行探讨。
채용자공천사법，이불동적B파공솔(분별위24，30，60，90화120 W)，재단정규(100)화불수강기저상제비일계렬불동B함량적ZrBN복합막，이용소묘전경、능보의、X사선연사의、납미압흔의(CSM)화마찰마손시험궤연구B파공솔대ZrBN복합막적미결구、역학성능、이급실온화고온마찰성능적영향。결과표명：당B파공솔저우30 W시，복합막정fcc ZrBN결구；당B파공솔고우30 W시，복합막위fcc ZrBN화hcp ZrB2쌍상결구。당B파공솔위24 W시，복합막적경도화실온마찰인수분별위29.3 GPa화0.75，수B파공솔증대，경도화실온마찰인수도축점감소。B파공솔위24 W시제비적ZrBN복합막적마찰인수수온도승고선감소후증대。동시，대ZrBN복합막적마찰궤리진행탐토。
ZrBN composite films with different B contents were prepared on wafers of silicon (100) and stainless steel by reactive magnetron sputtering technique with same Zr target power and different B target powers ( 24,30,60,90 and 120 W). The microstructures, mechanical properties and friction properties at different test temperatures were investigated by SEM-EDS analysis, X-ray diffraction, nano-indentation CSM and high-temperature ball-on-disc tribo-meter. The results show that, the coatings exhibit fcc ZrBN structure when the power of B target is below 30 W, when the power of B target is above 30 W the films show a two phase structure comprising fcc ZrBN phase and hcp ZrB2 phase. When the power of B target is 24 W, the hardness and friction coefficient of composite films is 29.3 GPa and 0.75, respectively. The hardness and friction coefficient gradually decreases with increasing B target power. The friction coefficient of ZrBN composite films with B target power of 24 W decreases and then increases with increasing temperature. Tribological mechanism of ZrBN composite films is also discussed.