CAJ | 학술논문

运用热丝化学气相沉积（HFCVD）的方法制备了以多孔钛为基体的掺杂硼金刚石（porous Ti/BDD）薄膜电极，并测试了它的主要物理性质，SEM 表明金刚石相生长良好并且能均匀地分布在基体表面和孔内，Raman光谱表明电极的金刚石相纯而且质量很高。采用循环伏安法研究了酸性条件下茜素红在多孔Ti/BDD电极上的电氧化行为。通过改变阳极电流密度、支持电解质Na2SO4的浓度来研究茜素红在多孔Ti/BDD电极上的电化学氧化降解的效果影响。结果表明：电流密度40 mA/cm2、支持电解质浓度0.5 mol/L为较理想的工艺参数，总电流效率达到30.2%。在相同条件下，发现多孔Ti/BDD薄膜电极氧化降解茜素红与平板Ti/BDD薄膜电极相比具有更高的电流效率。紫外可见光光谱证实了多孔Ti/BDD电极能够有效地电氧化降解茜素红。
운용열사화학기상침적（HFCVD）적방법제비료이다공태위기체적참잡붕금강석（porous Ti/BDD）박막전겁，병측시료타적주요물이성질，SEM 표명금강석상생장량호병차능균균지분포재기체표면화공내，Raman광보표명전겁적금강석상순이차질량흔고。채용순배복안법연구료산성조건하천소홍재다공Ti/BDD전겁상적전양화행위。통과개변양겁전류밀도、지지전해질Na2SO4적농도래연구천소홍재다공Ti/BDD전겁상적전화학양화강해적효과영향。결과표명：전류밀도40 mA/cm2、지지전해질농도0.5 mol/L위교이상적공예삼수，총전류효솔체도30.2%。재상동조건하，발현다공Ti/BDD박막전겁양화강해천소홍여평판Ti/BDD박막전겁상비구유경고적전류효솔。자외가견광광보증실료다공Ti/BDD전겁능구유효지전양화강해천소홍。
Boron doped diamond films on porous Ti substrates were prepared by hot-filament chemical vapor deposition (HFCVD) and its main physical behaviors were studied. SEM analysis showed that diamond phase can grow well and distributed on the surface and the hole of the substrate. Ramen spectroscopy showed that the electrode had a pure and high quality diamond phase. The Alizarin Red electrochemical oxidation behavior had been studied with porous Ti/BDD electrode under acidic conditions by cyclic voltammetry. The effects of electrochemical oxidation degradation were investigated by change the anodic current density and the concentration of supporting electrolyte. The results showed that the anodic current density 40 mA/cm2,supporting electrolyte concentration was the ideal technological parameters and the general current efficiency was 30.2%. The results also showed that the porous Ti/BDD film electrode electrochemical oxidation Alizarin Red had a higher current efficiency compared with flat Ti/BDD film electrode in the same condition. The results of UV-visible spectroscopy detection confirmed that Alizarin Red can be degraded efficiently by electrochemical oxidation.