CAJ | 학술논문

以低浓度的Zn（NO3）2为电解液、KCl为支持电解质，采用电沉积自组装法在氧化铟锡（ITO）玻璃基片上成功制备了尺寸可控、性能优异、具有强的C轴择优取向生长的纳米柱ZnO薄膜；并进一步获得了六方晶体纳米结构的ZnO薄膜的优化沉积工艺．同时，结合X射线衍射（XRD）、扫描电镜测试（SEM）、透射电镜（TEM）、紫外吸收光谱（UV-vis）等测试手段对薄膜的形貌、晶形及光学性能进行了系统表征．结果表明，制备的ZnO薄膜为六方纤锌矿结构，且沿[002]方向的择优生长趋势明显、物相纯正；该薄膜的透射率最大值可达75％，禁带宽度接近于3．28 eV．
이저농도적Zn（NO3）2위전해액、KCl위지지전해질，채용전침적자조장법재양화인석（ITO）파리기편상성공제비료척촌가공、성능우이、구유강적C축택우취향생장적납미주ZnO박막；병진일보획득료륙방정체납미결구적ZnO박막적우화침적공예．동시，결합X사선연사（XRD）、소묘전경측시（SEM）、투사전경（TEM）、자외흡수광보（UV-vis）등측시수단대박막적형모、정형급광학성능진행료계통표정．결과표명，제비적ZnO박막위륙방섬자광결구，차연[002]방향적택우생장추세명현、물상순정；해박막적투사솔최대치가체75％，금대관도접근우3．28 eV．
Zinc oxide(ZnO) films were electrodeposited from low concentration of Zn (NO3)2 as electrolyte on the ITO substrates.The electrochemical method has the ability to “tailor” deposited structure, properties and to form a high-aspect-ratio ZnO film.And optimized condition hexagonal crystal of ZnO film has been determined ultimately .The morphology , microstructure and optical performance of ZnO films were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM) , X-ray diffraction (XRD) etc.The effects on different concentra-tions of Zn 2+, NO3 -and Cl -in electrolyte on the growth of ZnO nanopillars were studied .The results showed that ZnO nanocrystalline thin films has wrutzite structure and growth tendency of [002] orientation obviously .Optical char-acterizations showed that the maximum value of optical transmittance of the film up to 75%, the optical bandgap energy value was about to 3.28 eV.