CAJ | 학술논문

用游离磨料对圆光栅玻璃表面进行了研磨抛光实验,讨论了磨粒尺寸、磨料质量分数、加工时间、研磨盘转速、加载压力、抛光垫材料对试件表面粗糙度和材料去除率的影响。研究表明,硬质抛光垫能更好地保持试件的平面度。获得的优化工艺参数组合为：研磨盘转速75 r/min；磨料质量分数10%；研磨液流量10 mL/min；5μm 的 Al2 O 3加载压力0.019 MPa,粗研20 min；1μm 的 Al2 O 3加载压力0.015 MPa,精研20 min；30 nm 的 CeO 2加载压力0.012 MPa,精抛10 min。在该工艺组合下,获得了表面粗糙度值Ra 为3.3 nm、平面度为5μm 的圆光栅玻璃。
용유리마료대원광책파리표면진행료연마포광실험,토론료마립척촌、마료질량분수、가공시간、연마반전속、가재압력、포광점재료대시건표면조조도화재료거제솔적영향。연구표명,경질포광점능경호지보지시건적평면도。획득적우화공예삼수조합위：연마반전속75 r/min；마료질량분수10%；연마액류량10 mL/min；5μm 적 Al2 O 3가재압력0.019 MPa,조연20 min；1μm 적 Al2 O 3가재압력0.015 MPa,정연20 min；30 nm 적 CeO 2가재압력0.012 MPa,정포10 min。재해공예조합하,획득료표면조조도치Ra 위3.3 nm、평면도위5μm 적원광책파리。
Free abrasive was used to lap and polish the circular grating glass,and the influence of process parameters,namely abrasive size,concentration of lapping liquid,processing time,plate speed,working pleasure,polishing pad material,on the surface quality and machining efficiency were discussed.Results showed that the hard polishing pad was better for the flatness of the glass.The optimized parameters are as follows:rotating speed 75 r/min,slurry concentration 10wt%,slurry flow 10 mL/min,5 μm Al2 O3 for rough lapping(20 min,0.019 MPa),1 μm Al2 O3 for finishing(20 min,0.015 MPa),30 nm CeO2 for polishing(10 min,0.012 MPa).The surface roughness of the glass could reach R a 3.3 nm and the flatness reached 5 μm.