CAJ | 학술논문

目前，作为集成电路以及纳米加工主流工艺的光学光刻技术，由于其受到光学衍射极限的物理限制，在16 nm线宽及其以下节点的结构制造中，其技术复杂性和设备制造成本大大增加。纳米压印作为一种高分辨率、高效率、低成本和操作过程简单的技术，引起了各国研究人员的广泛关注。然而纳米压印中不可避免引入的机械压力又会引发纳米结构几何变形、变尺寸结构填充不均匀等问题。本项目针对常规纳米压印存在的问题，基于介电聚合物的电流体动力学行为研究，提出了利用电场力替代机械力的电驱动模塑技术，在保持纳米压印突出优势的前提下，克服或避免了机械压力引发的技术性难题，成功实现了15 nm节点结构的高保真复型以及深宽比8的大深宽比纳米结构成型。
목전，작위집성전로이급납미가공주류공예적광학광각기술，유우기수도광학연사겁한적물리한제，재16 nm선관급기이하절점적결구제조중，기기술복잡성화설비제조성본대대증가。납미압인작위일충고분변솔、고효솔、저성본화조작과정간단적기술，인기료각국연구인원적엄범관주。연이납미압인중불가피면인입적궤계압력우회인발납미결구궤하변형、변척촌결구전충불균균등문제。본항목침대상규납미압인존재적문제，기우개전취합물적전류체동역학행위연구，제출료이용전장력체대궤계력적전구동모소기술，재보지납미압인돌출우세적전제하，극복혹피면료궤계압력인발적기술성난제，성공실현료15 nm절점결구적고보진복형이급심관비8적대심관비납미결구성형。
As the mainstream process for integratedcircuit and nano-fabrication, the conventional optical lithography process has been troubled by the optical diffraction in-herent in this technology, which tends to make the pat-terning at 16 nm linewidth or below prohibitively compli-cated and expensive. While the nanoimprint lithography has drawn a wide attention due to its highe resolution, high efficiency, cost-effectiveness and simple operation, it has been challenged by the structural distortion and non-uniformly duplication with varying size due to the application of a mechanical pressure. According to the challenge of the nanoimprint lithography and based on an electrohydrodynamic analysis of dielectric polymer, our research group has proposed an electrically driven nano-molding utilizing an electrostatic interface pressure instead of the mechanical pressure to duplicate arbitrary nano-structures with high fidelity. This technique not only retains the superiority of the nanoimprint lithogra-phy but can also avoid the technical challenges incurred by the mechanical pressure, demonstrating a capability of generating nano-structures with a feature linewidth of 15 nm and nano-structures with an aspect ratio of 8 .