长春理工大学学报(自然科学版)
長春理工大學學報(自然科學版)
장춘리공대학학보(자연과학판)
JOURNAL OF CHANGCHUN UNIVERSITY OF SCIENCE AND TECHNOLOGY(NATURAL SCIENCE EDITION)
2014年
1期
48-51
,共4页
朱明海%陈广彬%冯禹%龚楠%汪剑波
硃明海%陳廣彬%馮禹%龔楠%汪劍波
주명해%진엄빈%풍우%공남%왕검파
磁控溅射%掺杂%复合薄膜%禁带宽度
磁控濺射%摻雜%複閤薄膜%禁帶寬度
자공천사%참잡%복합박막%금대관도
magnetron sputtering%doping%composite film%band gap
TiO2是作为一种宽禁带半导体材料可作为紫外器件,但因其间接带隙结构、禁带宽度仅为3.0eV等特点,严重影响其应用范围。本文利用共溅射技术,通过Zn掺杂,在K9玻璃基底上制备了Ti-Zn-O复合薄膜,并研究了Zn溅射功率对其结构及光学性质的影响。结果显示:所制备的薄膜为ZnTiO3和不饱和TiO2的复合结构,随着Zn粒子的溅射能量增加,晶粒尺寸和表面粗糙度增加,并可将薄膜本征吸收边蓝移至3.61eV。
TiO2是作為一種寬禁帶半導體材料可作為紫外器件,但因其間接帶隙結構、禁帶寬度僅為3.0eV等特點,嚴重影響其應用範圍。本文利用共濺射技術,通過Zn摻雜,在K9玻璃基底上製備瞭Ti-Zn-O複閤薄膜,併研究瞭Zn濺射功率對其結構及光學性質的影響。結果顯示:所製備的薄膜為ZnTiO3和不飽和TiO2的複閤結構,隨著Zn粒子的濺射能量增加,晶粒呎吋和錶麵粗糙度增加,併可將薄膜本徵吸收邊藍移至3.61eV。
TiO2시작위일충관금대반도체재료가작위자외기건,단인기간접대극결구、금대관도부위3.0eV등특점,엄중영향기응용범위。본문이용공천사기술,통과Zn참잡,재K9파리기저상제비료Ti-Zn-O복합박막,병연구료Zn천사공솔대기결구급광학성질적영향。결과현시:소제비적박막위ZnTiO3화불포화TiO2적복합결구,수착Zn입자적천사능량증가,정립척촌화표면조조도증가,병가장박막본정흡수변람이지3.61eV。
TiO2 can be used as UV device because it is a wide band gap semiconductor material,however,because of the indirect band gap structure;the band gap is only 3.0eV, etc., seriously affecting its scope of application. In this paper, Ti-Zn-O composite film was prepared on K9 glass substrate by sputtering technique, and the effects of Zn sputtering power of its structure and optical properties were researched. The results showed that the prepared films were ZnTiO3 and unsaturated TiO2 composite structure, with the increase of Zn sputtering energy, the crystallite size and the surface roughness were both increased,and the intrinsic absorption edge of the films was blue shifted to 3.61eV.