深圳大学学报（理工版）
深圳大學學報（理工版）
심수대학학보（리공판）
JOURNAL OF SHENZHEN UNIVERSITY (SCIENCE & ENGINEERING)
2014年
2期
174-178
,共5页
廖华%胡昕%杨勤劳%王光超%王云程%阔晓梅
廖華%鬍昕%楊勤勞%王光超%王雲程%闊曉梅
료화%호흔%양근로%왕광초%왕운정%활효매
数字成像%掺杂浓度%基底刻蚀%晶柱生长%空间分辨%X射线转换屏
數字成像%摻雜濃度%基底刻蝕%晶柱生長%空間分辨%X射線轉換屏
수자성상%참잡농도%기저각식%정주생장%공간분변%X사선전환병
digital imaging%doping concentration%etching substrate%growing crystal columns%spatial resolution%X-ray converting screen
通过对X射线转换屏制备过程中， Tl+掺杂浓度、基底刻蚀、晶柱生长过程和防潮解等方面的大量实验研究，得到最佳掺杂浓度(摩尔比为0．055%)及合适的基底刻蚀深度(5μm)与工艺，实现对晶柱生长过程中表面形貌、温度、压力和转速的控制，研制出有效直径为100 mm、空间分辨率约为12 lp/mm (厚度为300μm)的CsI ( Tl) X射线转换屏.
通過對X射線轉換屏製備過程中， Tl+摻雜濃度、基底刻蝕、晶柱生長過程和防潮解等方麵的大量實驗研究，得到最佳摻雜濃度(摩爾比為0．055%)及閤適的基底刻蝕深度(5μm)與工藝，實現對晶柱生長過程中錶麵形貌、溫度、壓力和轉速的控製，研製齣有效直徑為100 mm、空間分辨率約為12 lp/mm (厚度為300μm)的CsI ( Tl) X射線轉換屏.
통과대X사선전환병제비과정중， Tl+참잡농도、기저각식、정주생장과정화방조해등방면적대량실험연구，득도최가참잡농도(마이비위0．055%)급합괄적기저각식심도(5μm)여공예，실현대정주생장과정중표면형모、온도、압력화전속적공제，연제출유효직경위100 mm、공간분변솔약위12 lp/mm (후도위300μm)적CsI ( Tl) X사선전환병.
Aimed to obtain a CsI ( Tl) X-ray converting screen with high spatial resolution, a lot of experiments have been carried out including Tl+ doping concentrations, etching substrates, and growing crystal columns. It is found that the mole ratio of 0. 055% and 5 μm is the best doping concentration and etching depth respectively. Also well controlled are the influence factors for the crystal column growing, such as surface features, temperatures, pressures, and speeds of rotation. The experimental evaluation has shown that a CsI ( Tl) X-ray converting screen with spatial resolution of 12 lp/mm ( the thickness of 300 μm) and active diameter of 100 mm is developed successfully.
