现代电子技术
現代電子技術
현대전자기술
MODERN ELECTRONICS TECHNIQUE
2014年
20期
120-122,126
,共4页
杨莲红%张保花%王俊珺%魏伟
楊蓮紅%張保花%王俊珺%魏偉
양련홍%장보화%왕준군%위위
日盲型%紫外探测器%金属有机化学气相沉积法%AlGaN%光谱响应
日盲型%紫外探測器%金屬有機化學氣相沉積法%AlGaN%光譜響應
일맹형%자외탐측기%금속유궤화학기상침적법%AlGaN%광보향응
solar-blind ultraviolet photodetector%MOCVD method AlGaN%spectral response
采用低压-金属有机化学气相沉积(MOCVD)法在(0001)方向的AlN/蓝宝石模板上生长得到Al组分为40%的AlGaN材料,设计并制作了MSM型AlGaN 日盲紫外探测器。通过HRXRD,SEM,AFM对AlGaN材料进行了表征,结果表明:该材料为六方相结构,且应变程度很小,粗糙度(RMS)为1.32 nm。通过测试器件在230~320 nm之间、在不同偏压下的光谱响应曲线,发现器件的截止波长在285 nm附近,截止边很陡峭;器件的峰值响应波长为275 nm;在7 V偏压下,器件峰值响应度达到最大2.8 mA/W;零偏压下,器件的暗电流1×10-13A,器件的暗电流很小。
採用低壓-金屬有機化學氣相沉積(MOCVD)法在(0001)方嚮的AlN/藍寶石模闆上生長得到Al組分為40%的AlGaN材料,設計併製作瞭MSM型AlGaN 日盲紫外探測器。通過HRXRD,SEM,AFM對AlGaN材料進行瞭錶徵,結果錶明:該材料為六方相結構,且應變程度很小,粗糙度(RMS)為1.32 nm。通過測試器件在230~320 nm之間、在不同偏壓下的光譜響應麯線,髮現器件的截止波長在285 nm附近,截止邊很陡峭;器件的峰值響應波長為275 nm;在7 V偏壓下,器件峰值響應度達到最大2.8 mA/W;零偏壓下,器件的暗電流1×10-13A,器件的暗電流很小。
채용저압-금속유궤화학기상침적(MOCVD)법재(0001)방향적AlN/람보석모판상생장득도Al조분위40%적AlGaN재료,설계병제작료MSM형AlGaN 일맹자외탐측기。통과HRXRD,SEM,AFM대AlGaN재료진행료표정,결과표명:해재료위륙방상결구,차응변정도흔소,조조도(RMS)위1.32 nm。통과측시기건재230~320 nm지간、재불동편압하적광보향응곡선,발현기건적절지파장재285 nm부근,절지변흔두초;기건적봉치향응파장위275 nm;재7 V편압하,기건봉치향응도체도최대2.8 mA/W;령편압하,기건적암전류1×10-13A,기건적암전류흔소。
AlGaN material with 40%Al component was grown on AlN/sapphire substrate by low-voltage metal organic chemical vapor deposition(MOCVD)method. The AlGaN solar-blind UV photodetector with MSM structure was designed and fabricated. AlGaN material was characterized by using high resolution X-ray diffraction (HRXRD),scanning electron microscope (SEM) and atomic force microscopy(AFM). The results indicates that the material is hexagonal,its strain in the AlGaN is small and roughness(RMS)is 1.32 nm. According to the spectral response curve under various bias,it is found that the cut-off wave-length of the device is near 285 nm. The cut-off edge is very steep. The peak response wavelength is 275 nm. The peak respon-sivity is 2.8 mA/W at 7 V bias voltage. The dark current of detector is 1×10-13A under zero bias voltage,and very small.