CAJ | 학술논문

通过激光加热对 Ni81 Fe19(15 nm )/Ni45 Mn55(x nm)磁性双层膜进行快速退火处理,系统研究了激光辐照参数对交换偏置场(H ex )大小的影响。结果表明,激光的能量密度强烈影响双层膜交换偏置效应,并存在一个能量密度的阈值(约为150 mJ/cm2),此时磁性双层膜能够产生较明显的交换偏置现象。磁性双层膜的H ex 随着能量密度的进一步增加逐渐变大,但随后减小直至完全消失。当 NiMn 层厚度为25 nm时,经激光加热退火处理后双层膜的H ex 最大值约为26.2 kA/m,略大于常规退火后的 H ex 值(22.3 kA/m)。
통과격광가열대 Ni81 Fe19(15 nm )/Ni45 Mn55(x nm)자성쌍층막진행쾌속퇴화처리,계통연구료격광복조삼수대교환편치장(H ex )대소적영향。결과표명,격광적능량밀도강렬영향쌍층막교환편치효응,병존재일개능량밀도적역치(약위150 mJ/cm2),차시자성쌍층막능구산생교명현적교환편치현상。자성쌍층막적H ex 수착능량밀도적진일보증가축점변대,단수후감소직지완전소실。당 NiMn 층후도위25 nm시,경격광가열퇴화처리후쌍층막적H ex 최대치약위26.2 kA/m,략대우상규퇴화후적 H ex 치(22.3 kA/m)。
This paper deals with the exchange bias in Ni81Fe19(15 nm)/Ni45Mn55(x nm)bilayers annealed by la-ser.The influences of the laser parameters on the exchange bias (H ex )were systematic investigated.The re-sults show that the H ex was strongly affected by the energy density of laser,and that there exists a threshold of energy density (about 150 mJ/cm2)where the exchange bias appears.With the increase of energy density,the exchange coupling becomes stronger and reaches a maximum;then it disappears gradually.In the case of the thickness of NiMn was 25 nm,the Hex was 26.2 kA/m after laser thermal annealing,which was slightly higher than that of conventional thermal annealing (22.3 kA/m).