电镀与涂饰
電鍍與塗飾
전도여도식
ELECTROPLATING & FINISHING
2014年
7期
275-278
,共4页
黄灵飞%曾振欧%冯冰%谢金平%李树泉
黃靈飛%曾振歐%馮冰%謝金平%李樹泉
황령비%증진구%풍빙%사금평%리수천
铜%铜-锡合金%电沉积%焦磷酸盐%添加剂%电化学
銅%銅-錫閤金%電沉積%焦燐痠鹽%添加劑%電化學
동%동-석합금%전침적%초린산염%첨가제%전화학
copper%copper-tin alloy%electrodeposition%pyrophosphate%additive%electrochemistry
采用电化学测试方法研究了焦磷酸盐溶液体系在铜电极表面电沉积Cu及Cu-Sn合金(低Sn)的电化学行为。探讨了添加剂JZ-1对电沉积Cu和Cu-Sn合金的影响,并对电沉积层的表面形貌和晶相结构进行分析。结果表明,焦磷酸盐溶液体系电沉积Cu及Cu-Sn合金均为不可逆电极过程,发生电化学极化。电沉积 Cu 的阴极过程表现为前置转化反应很快和以227CuP O -直接还原的反应机理形式。电沉积Cu-Sn合金过程中Cu与Sn之间存在相互作用,溶液中的Cu2+与Sn2+也存在相互促进电沉积的作用,Cu-Sn合金的晶相结构为Cu13.7Sn。添加剂JZ-1具有促进Cu电沉积和抑制Sn电沉积的双重作用,有利于降低Cu-Sn合金中的Sn含量并细化晶粒。
採用電化學測試方法研究瞭焦燐痠鹽溶液體繫在銅電極錶麵電沉積Cu及Cu-Sn閤金(低Sn)的電化學行為。探討瞭添加劑JZ-1對電沉積Cu和Cu-Sn閤金的影響,併對電沉積層的錶麵形貌和晶相結構進行分析。結果錶明,焦燐痠鹽溶液體繫電沉積Cu及Cu-Sn閤金均為不可逆電極過程,髮生電化學極化。電沉積 Cu 的陰極過程錶現為前置轉化反應很快和以227CuP O -直接還原的反應機理形式。電沉積Cu-Sn閤金過程中Cu與Sn之間存在相互作用,溶液中的Cu2+與Sn2+也存在相互促進電沉積的作用,Cu-Sn閤金的晶相結構為Cu13.7Sn。添加劑JZ-1具有促進Cu電沉積和抑製Sn電沉積的雙重作用,有利于降低Cu-Sn閤金中的Sn含量併細化晶粒。
채용전화학측시방법연구료초린산염용액체계재동전겁표면전침적Cu급Cu-Sn합금(저Sn)적전화학행위。탐토료첨가제JZ-1대전침적Cu화Cu-Sn합금적영향,병대전침적층적표면형모화정상결구진행분석。결과표명,초린산염용액체계전침적Cu급Cu-Sn합금균위불가역전겁과정,발생전화학겁화。전침적 Cu 적음겁과정표현위전치전화반응흔쾌화이227CuP O -직접환원적반응궤리형식。전침적Cu-Sn합금과정중Cu여Sn지간존재상호작용,용액중적Cu2+여Sn2+야존재상호촉진전침적적작용,Cu-Sn합금적정상결구위Cu13.7Sn。첨가제JZ-1구유촉진Cu전침적화억제Sn전침적적쌍중작용,유리우강저Cu-Sn합금중적Sn함량병세화정립。
The electrochemical behaviors of Cu and low-Sn Cu-Sn alloy electrodeposition on copper electrode from aqueous pyrophosphate bath were studied by electrochemical test methods. The effect of additive JZ-1 on Cu and Cu-Sn alloy electrodeposition was discussed and the surface morphologies and crystal structures of electrodeposited coatings were analyzed. The results showed that both Cu and Cu-Sn alloy electrodeposition from aqueous pyrophosphate bath are irreversible electrode process, during which electrochemical polarization happens. It was considered that the reaction mechanism of the cathodic process of Cu electrodeposition consists of fast preceding chemical transformation step and direct reduction of 22 7CuP O -. There is interaction between Cu and Sn during Cu-Sn alloy electrodeposition process, as well as mutual promotion between Cu2+ and Sn2+in electrodeposition. The crystal structure of Cu-Sn alloy is Cu13.7Sn. The additive JZ-1 has a dual role of promoting Cu electrodeposition and inhibiting Sn electrodeposition, which is benefit for the reduction of Sn content in Cu-Sn alloy and grain refinement.