中国电机工程学报
中國電機工程學報
중국전궤공정학보
ZHONGGUO DIANJI GONGCHENG XUEBAO
2014年
12期
1957-1964
,共8页
孙志%王暄%韩柏%雷清泉
孫誌%王暄%韓柏%雷清泉
손지%왕훤%한백%뢰청천
聚酰亚胺%开尔文力显微镜%表面电荷%纳米杂化%耐电晕
聚酰亞胺%開爾文力顯微鏡%錶麵電荷%納米雜化%耐電暈
취선아알%개이문력현미경%표면전하%납미잡화%내전훈
polyimide film%Kelvin Force Microscope%surface charge%nano-doping%corona-resistance
为在微纳米尺度下研究无机纳米掺杂对聚酰亚胺表面电荷特性的影响,采用开尔文力显微镜测量了杜邦公司生产的原始聚酰亚胺薄膜和纳米掺杂耐电晕聚酰亚胺薄膜二种材料,在被导电微探针注入电荷后的表面电荷发生、发展特性。实验发现,在相同的电荷注入条件下,耐电晕薄膜上表面电荷积累量约为原始聚酰亚胺薄膜上电荷积累量的50%;耐电晕薄膜上电荷消散速度较快,约为原始聚酰亚胺薄膜上的4~5倍。分析可知,耐电晕薄膜由于掺杂了纳米颗粒Al2O3,使得薄膜的注入势垒增大、电阻率减小,这些因素减少了耐电晕薄膜表面电荷的积累,避免了局部电场畸变,进而增强了材料的耐电晕特性。
為在微納米呎度下研究無機納米摻雜對聚酰亞胺錶麵電荷特性的影響,採用開爾文力顯微鏡測量瞭杜邦公司生產的原始聚酰亞胺薄膜和納米摻雜耐電暈聚酰亞胺薄膜二種材料,在被導電微探針註入電荷後的錶麵電荷髮生、髮展特性。實驗髮現,在相同的電荷註入條件下,耐電暈薄膜上錶麵電荷積纍量約為原始聚酰亞胺薄膜上電荷積纍量的50%;耐電暈薄膜上電荷消散速度較快,約為原始聚酰亞胺薄膜上的4~5倍。分析可知,耐電暈薄膜由于摻雜瞭納米顆粒Al2O3,使得薄膜的註入勢壘增大、電阻率減小,這些因素減少瞭耐電暈薄膜錶麵電荷的積纍,避免瞭跼部電場畸變,進而增彊瞭材料的耐電暈特性。
위재미납미척도하연구무궤납미참잡대취선아알표면전하특성적영향,채용개이문력현미경측량료두방공사생산적원시취선아알박막화납미참잡내전훈취선아알박막이충재료,재피도전미탐침주입전하후적표면전하발생、발전특성。실험발현,재상동적전하주입조건하,내전훈박막상표면전하적루량약위원시취선아알박막상전하적루량적50%;내전훈박막상전하소산속도교쾌,약위원시취선아알박막상적4~5배。분석가지,내전훈박막유우참잡료납미과립Al2O3,사득박막적주입세루증대、전조솔감소,저사인소감소료내전훈박막표면전하적적루,피면료국부전장기변,진이증강료재료적내전훈특성。
To investigate the effect of inorganic nanoparticles on the surface charge properties of polyimide (PI) at the micro/nano scale, the measurement on surface charge was carried out with both the original PI film and nano-Al2O3 filled corona-resisting PI film by Kelvin Force Microscope (KFM). Experimental results show that: the surface charge accumulation on corona-resisting PI film under the same constraints reduced to 50% of that on original PI film, and charge dissipate quickly for the corona-resisting PI film. Time constant of exponential decay on original PI is four to five times to the corona-resisting PI. It could be deduced from above results that due to doping of Al2O3 made the injection barrier increases and the resistivity decreases for corona-resisting PI film than original PI fill. These factors lead to reduce the surface charge accumulation and avoid distortion of local electric field. Hence, the corona resistant performance is enhanced.