CAJ | 학술논문

用磁控溅射的方法在硅衬底上制备了二氧化钛薄膜，并通过改变薄膜沉积过程中氧气含量、溅射时间、工作压强、衬底温度等溅射参数，制备了系列薄膜样品，得到了二氧化钛薄膜两种相结构的最佳生成条件。研究表明：较高的工作压强有利于金红石结构的生成；衬底加热、增加沉积时间有利于生成锐钛矿结构；氧气含量的变化对薄膜的相结构没有明显影响。
용자공천사적방법재규츤저상제비료이양화태박막，병통과개변박막침적과정중양기함량、천사시간、공작압강、츤저온도등천사삼수，제비료계렬박막양품，득도료이양화태박막량충상결구적최가생성조건。연구표명：교고적공작압강유리우금홍석결구적생성；츤저가열、증가침적시간유리우생성예태광결구；양기함량적변화대박막적상결구몰유명현영향。
The TiO2 films were successfully deposited on Si substrates by magnetron sputtering .We obitained the optimum growth condition of rutile and anatase TiO2 films by changing deposition oxygen content ,sputte-ring pressure ,sputtering power ,sputtering time and substrate temperature .The experimental results show that higher sputtering pressure is good for rutile deposition .Heated substrate and more sputtering time are good for anatase deposition .But the effection of oxygen content on phase structure is not obvious .