环境科学与管理
環境科學與管理
배경과학여관리
ENVIRONMENTAL SCIENCE AND MANAGEMENT
2014年
3期
106-108
,共3页
王春冬%张云秀%徐鸣%厉晓华
王春鼕%張雲秀%徐鳴%厲曉華
왕춘동%장운수%서명%려효화
微电解%半导体%含铜废水%处理方法
微電解%半導體%含銅廢水%處理方法
미전해%반도체%함동폐수%처리방법
micro-electrolysis%semiconductor%cupriferous wastewater%treatment process
半导体废水中，含铜废液一般采用委托处理的方式，而含铜废水通常采用与酸性废水混合后进入中和系统再排放。在300 mm晶圆制造过程中，由于含铜废水水量波动大，如果未经有效处理就排放，容易造成总排口铜的超标。采用铁炭微电解对半导体含铜废水处理，研究表明：投加铁炭填料100 g/L，pH调至2.2，反应60分钟进水水质指标范围，铜的去除率可以达到97％以上。
半導體廢水中，含銅廢液一般採用委託處理的方式，而含銅廢水通常採用與痠性廢水混閤後進入中和繫統再排放。在300 mm晶圓製造過程中，由于含銅廢水水量波動大，如果未經有效處理就排放，容易造成總排口銅的超標。採用鐵炭微電解對半導體含銅廢水處理，研究錶明：投加鐵炭填料100 g/L，pH調至2.2，反應60分鐘進水水質指標範圍，銅的去除率可以達到97％以上。
반도체폐수중，함동폐액일반채용위탁처리적방식，이함동폐수통상채용여산성폐수혼합후진입중화계통재배방。재300 mm정원제조과정중，유우함동폐수수량파동대，여과미경유효처리취배방，용역조성총배구동적초표。채용철탄미전해대반도체함동폐수처리，연구표명：투가철탄전료100 g/L，pH조지2.2，반응60분종진수수질지표범위，동적거제솔가이체도97％이상。
In semiconductor industry, high concentration cupriferous wastewater is treated by commissioned in general; low concentration cupriferous wastewater is treated in neutralization system after mixed with acidity wastewater .It is easy to cause ex-cessive copper discharge without effective treatment due to its large fluctuations in 300 mm wafer production.Treatment of cuprif-erous wastewater was tested by micro-electrolysis process, the results showed that when the dosage of iron carbon-carbon was 10%, the pH value of wastewater was 2.2, and the reaction time was 60 minutes, the removal rates of copper was higher than 97%.
