CAJ | 학술논문

采用双层辉光离子渗金属技术,在硬质合金基体表面上制备了氮化钛（TiN）薄膜,通过微观结构和显微硬度分析,研究了基体温度对TiN薄膜性能的影响.实验结果表明：所有TiN样品均具有面心立方结构,并且薄膜生长的择优取向、晶粒尺寸、晶面间距、晶格常数和微观硬度等都与基体温度密切相关.当基体温度为650～780℃时,TiN薄膜具有最小的晶粒尺寸（26.9 nm）和最大的显微硬度（2204 HV）.
채용쌍층휘광리자삼금속기술,재경질합금기체표면상제비료담화태（TiN）박막,통과미관결구화현미경도분석,연구료기체온도대TiN박막성능적영향.실험결과표명：소유TiN양품균구유면심립방결구,병차박막생장적택우취향、정립척촌、정면간거、정격상수화미관경도등도여기체온도밀절상관.당기체온도위650～780℃시,TiN박막구유최소적정립척촌（26.9 nm）화최대적현미경도（2204 HV）.
Titanium nitride（TiN） films were directly deposited on the surface of hard alloy tools（YG8） using the double-glow discharge plasma surface alloying technique.The influence of substrate temperature on the microstructural and mechanical properties of TiN films was investigated by X-ray diffraction（XRD） and microhardness test.Experimental results demonstrate that the prepared TiN films are all the face-centered cubic（fcc） structure,and that the substrate temperature significantly affects the preferred orientation,crystallite size,plane spacing,lattice constant and microhardness of the films.The TiN film deposited at substrate temperature of 650~780 ℃ has the maximum microhardness of 2204 HV and the minimum crystallite size of 26.9 nm.