中南民族大学学报:自然科学版
中南民族大學學報:自然科學版
중남민족대학학보:자연과학판
Journal of South-Central University for Nationalities
2012年
1期
66-70
,共5页
陈首部%韦世良%何翔%孙奉娄
陳首部%韋世良%何翔%孫奉婁
진수부%위세량%하상%손봉루
双层辉光离子渗金属技术%氮化钛薄膜%微观结构
雙層輝光離子滲金屬技術%氮化鈦薄膜%微觀結構
쌍층휘광리자삼금속기술%담화태박막%미관결구
double-glow discharge plasma surface alloying technique%titanium nitride films%microstruture
采用双层辉光离子渗金属技术,在硬质合金基体表面上制备了氮化钛(TiN)薄膜,通过微观结构和显微硬度分析,研究了基体温度对TiN薄膜性能的影响.实验结果表明:所有TiN样品均具有面心立方结构,并且薄膜生长的择优取向、晶粒尺寸、晶面间距、晶格常数和微观硬度等都与基体温度密切相关.当基体温度为650~780℃时,TiN薄膜具有最小的晶粒尺寸(26.9 nm)和最大的显微硬度(2204 HV).
採用雙層輝光離子滲金屬技術,在硬質閤金基體錶麵上製備瞭氮化鈦(TiN)薄膜,通過微觀結構和顯微硬度分析,研究瞭基體溫度對TiN薄膜性能的影響.實驗結果錶明:所有TiN樣品均具有麵心立方結構,併且薄膜生長的擇優取嚮、晶粒呎吋、晶麵間距、晶格常數和微觀硬度等都與基體溫度密切相關.噹基體溫度為650~780℃時,TiN薄膜具有最小的晶粒呎吋(26.9 nm)和最大的顯微硬度(2204 HV).
채용쌍층휘광리자삼금속기술,재경질합금기체표면상제비료담화태(TiN)박막,통과미관결구화현미경도분석,연구료기체온도대TiN박막성능적영향.실험결과표명:소유TiN양품균구유면심립방결구,병차박막생장적택우취향、정립척촌、정면간거、정격상수화미관경도등도여기체온도밀절상관.당기체온도위650~780℃시,TiN박막구유최소적정립척촌(26.9 nm)화최대적현미경도(2204 HV).
Titanium nitride(TiN) films were directly deposited on the surface of hard alloy tools(YG8) using the double-glow discharge plasma surface alloying technique.The influence of substrate temperature on the microstructural and mechanical properties of TiN films was investigated by X-ray diffraction(XRD) and microhardness test.Experimental results demonstrate that the prepared TiN films are all the face-centered cubic(fcc) structure,and that the substrate temperature significantly affects the preferred orientation,crystallite size,plane spacing,lattice constant and microhardness of the films.The TiN film deposited at substrate temperature of 650~780 ℃ has the maximum microhardness of 2204 HV and the minimum crystallite size of 26.9 nm.