CAJ | 학술논문

建立了液态金属膜流MHD流动的数学物理模型，开发了相关数值模拟程序。首先，通过相关实验结果对该程序进行了校验。然后，对液态金属锂膜流在横向强磁场中的MHD流动进行了模拟，给出了入口流速、入口膜厚、底壁宽度、壁面粗糙度对其MHD流动的影响。模拟结果表明，存在唯一入口流速和唯一底壁宽度使得膜流MHD流动稳定；存在两个入口膜厚值使得膜流MHD流动稳定；壁面粗糙度对膜流MHD流动影响较小。最后，通过膜流MHD流动平衡分析，初步给出了其MHD稳定性的物理机制。分析结果表明，增加底壁宽度有利于降低电磁阻力，增加膜流的MHD稳定性；膜流的稳定流速随入口膜厚的增加先增大后减小，同时其最大稳定流速值相对于无磁场的情况减小很多。
건립료액태금속막류MHD류동적수학물리모형，개발료상관수치모의정서。수선，통과상관실험결과대해정서진행료교험。연후，대액태금속리막류재횡향강자장중적MHD류동진행료모의，급출료입구류속、입구막후、저벽관도、벽면조조도대기MHD류동적영향。모의결과표명，존재유일입구류속화유일저벽관도사득막류MHD류동은정；존재량개입구막후치사득막류MHD류동은정；벽면조조도대막류MHD류동영향교소。최후，통과막류MHD류동평형분석，초보급출료기MHD은정성적물리궤제。분석결과표명，증가저벽관도유리우강저전자조력，증가막류적MHD은정성；막류적은정류속수입구막후적증가선증대후감소，동시기최대은정류속치상대우무자장적정황감소흔다。
A mathematical and physical modeling of the liquid metal MHD film flow has been built and a related numerical code has been developed. Firstly, the code is validated by the related experimental results. Secondly, numerical simulation of the liquid metal MHD film flow is carried out by this code. The effects of the inlet velocity, the initial film thickness, the width of the bottom wall and the wall roughness on the flow state are presented. It is indicated that there is only one value of the inlet velocity and the substrate width when the film flow state is stable, and two initial film thickness values exist at the stable state, the wall roughness has little effect on the film flow state. In the end, the preliminary stable mechanism of the film MHD flow based on a equilibrium analysis is described, it is indicated that the increase of the substrate width is helpful to reduce the electromagnetic resistance and increase the MHD stability;the stable velocity firstly increases then decreases with the increase of the initial film thickness and it is greatly reduced compared to the no magnetic field case.