中国有色金属学报(英文版)
中國有色金屬學報(英文版)
중국유색금속학보(영문판)
TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA
2013年
10期
2957-2961
,共5页
夏木建%丁红燕%周广宏%章跃
夏木建%丁紅燕%週廣宏%章躍
하목건%정홍연%주엄굉%장약
多层膜%结合力%TiB2薄膜%磁控溅射%纳米硬度
多層膜%結閤力%TiB2薄膜%磁控濺射%納米硬度
다층막%결합력%TiB2박막%자공천사%납미경도
multilayered films%adhesion%TiB2 films%magnetron sputtering%nano-hardness
基于多层膜优异的力学性能,采用磁控溅射法在316L不锈钢基体表面沉淀[Ti/TiB2]n (n=1,2,3)多层膜以增强TiB2薄膜的膜基结合强度。研究周期数对多层膜的结构、硬度及结合力的影响。结果表明:TiB2单层膜表现为(001)方向的织构。随着周期数的增加,多层膜的织构方向由(001)转变为(100);多层膜的硬度从20 GPa增加到26 GPa,但略低于TiB2单层膜的硬度(33 GPa);相对于单膜的膜基结合力(9.5 N),多层膜表现出较好膜基结合力,最大结合力可达24 N。
基于多層膜優異的力學性能,採用磁控濺射法在316L不鏽鋼基體錶麵沉澱[Ti/TiB2]n (n=1,2,3)多層膜以增彊TiB2薄膜的膜基結閤彊度。研究週期數對多層膜的結構、硬度及結閤力的影響。結果錶明:TiB2單層膜錶現為(001)方嚮的織構。隨著週期數的增加,多層膜的織構方嚮由(001)轉變為(100);多層膜的硬度從20 GPa增加到26 GPa,但略低于TiB2單層膜的硬度(33 GPa);相對于單膜的膜基結閤力(9.5 N),多層膜錶現齣較好膜基結閤力,最大結閤力可達24 N。
기우다층막우이적역학성능,채용자공천사법재316L불수강기체표면침정[Ti/TiB2]n (n=1,2,3)다층막이증강TiB2박막적막기결합강도。연구주기수대다층막적결구、경도급결합력적영향。결과표명:TiB2단층막표현위(001)방향적직구。수착주기수적증가,다층막적직구방향유(001)전변위(100);다층막적경도종20 GPa증가도26 GPa,단략저우TiB2단층막적경도(33 GPa);상대우단막적막기결합력(9.5 N),다층막표현출교호막기결합력,최대결합력가체24 N。
The periodic [Ti/TiB2]n (n=1, 2, 3) multilayered films were prepared on the substrate of AISI 316L stainless steel by magnetron sputtering to enhance the adhesion of TiB2 films based on the remarkable mechanical performance of layered films. The influence of periods on microstructure, adhesion and hardness of [Ti/TiB2]n multilayered films was studied. X-ray diffraction (XRD) analysis shows that the monolayer TiB2 films exhibit (001) preferred orientation, and the preferred orientation of [Ti/TiB2]n multilayered films transfers from (001) to (100) with the increase of periods. The cross-sectional morphology of each film displays homogeneity by field emission scanning electron microscopy (FESEM). The hardness of the films measured via nanoindention changes from 20 to 26 GPa with the increase of periods. These values of hardness are a bit lower than that of the monolayer TiB2 films which is up to 33 GPa. However, the [Ti/TiB2]n multilayered films present a considerably good adhesion, which reaches a maximum of 24 N, in comparison with the monolayer TiB2 films according to the experimental results.