高电压技术
高電壓技術
고전압기술
HIGH VOLTAGE ENGINEERING
2012年
5期
1157-1162
,共6页
郑其锋%聂勇%顾大勇%黄彤文%童星%计建炳
鄭其鋒%聶勇%顧大勇%黃彤文%童星%計建炳
정기봉%섭용%고대용%황동문%동성%계건병
填充介质%介质阻挡放电%硫酰氟%脱除机理%脱除效率%无害化处理
填充介質%介質阻擋放電%硫酰氟%脫除機理%脫除效率%無害化處理
전충개질%개질조당방전%류선불%탈제궤리%탈제효솔%무해화처리
filling dielectric%dielectric barrier discharge (DBD)%SF20z%removal mechanism%removal efficiency,harmless treatment
为研究脱除熏蒸后残留硫酰氟气体并达到无害化排放的要求,采用填充式介质阻挡放电等离子体技术进行研究。考察了石英玻璃球和氧化铝球两种不同填充介质下放电电压和能量密度对硫酰氟脱除效率的影响,分析了填充介质对硫酰氟脱除后的产物组成及脱除机理影响。结果表明:在相同电压下,填充氧化铝球时介质阻挡放电对硫酰氟的脱除效率明显高于石英玻璃球;氧化铝球作为填充介质时在能量密度为208J/L能完全脱除硫酰氟,相比填充石英玻璃球情况能耗减少50%以上。填充石英玻璃球时硫酰氟在介质阻挡放电作用下分解产物主要为SiF4,SO2和S;填充氧化铝球时介质阻挡放电可以有效地无害化脱除硫酰氟。
為研究脫除熏蒸後殘留硫酰氟氣體併達到無害化排放的要求,採用填充式介質阻擋放電等離子體技術進行研究。攷察瞭石英玻璃毬和氧化鋁毬兩種不同填充介質下放電電壓和能量密度對硫酰氟脫除效率的影響,分析瞭填充介質對硫酰氟脫除後的產物組成及脫除機理影響。結果錶明:在相同電壓下,填充氧化鋁毬時介質阻擋放電對硫酰氟的脫除效率明顯高于石英玻璃毬;氧化鋁毬作為填充介質時在能量密度為208J/L能完全脫除硫酰氟,相比填充石英玻璃毬情況能耗減少50%以上。填充石英玻璃毬時硫酰氟在介質阻擋放電作用下分解產物主要為SiF4,SO2和S;填充氧化鋁毬時介質阻擋放電可以有效地無害化脫除硫酰氟。
위연구탈제훈증후잔류류선불기체병체도무해화배방적요구,채용전충식개질조당방전등리자체기술진행연구。고찰료석영파리구화양화려구량충불동전충개질하방전전압화능량밀도대류선불탈제효솔적영향,분석료전충개질대류선불탈제후적산물조성급탈제궤리영향。결과표명:재상동전압하,전충양화려구시개질조당방전대류선불적탈제효솔명현고우석영파리구;양화려구작위전충개질시재능량밀도위208J/L능완전탈제류선불,상비전충석영파리구정황능모감소50%이상。전충석영파리구시류선불재개질조당방전작용하분해산물주요위SiF4,SO2화S;전충양화려구시개질조당방전가이유효지무해화탈제류선불。
Alumina and quartz glass balls were chosen as filling dielectric, and the packed bed dielectric barrier discharge (DBD) plasma was adopted to realize the harmless treatment Of sulfuryl fluoride (SO2 F2). The effects of discharge voltage and energy density on the removal efficiency of SO2F2 filled with different dielectrics were investigated, respectively. Meanwhile, the removal products and mechanism of SO2 F2 filled with different dielectrics in the DBD reactor were analyzed. Results showed that alumina dielectric was more effective for SF2O2 harmless treatment, and SF2Oz2 could be completely removed when the energy density was above 208 J/L. Compared with packing quartz glass balls, the energy consumption of packing alumina ball decreased by 50%. SOz F2 was degraded into SO2, S and SiF4 when quartz glass balls was filled in the DBD reactor. In terms of alumina dielectric, the harmful gaseous products after plasma treatment could be completely reacted and absorbed by alumina to realize the harmless treatment of SF2O2.