CAJ | 학술논문

采用反应磁控溅射法分别在单晶硅(100)和不锈钢基底上沉积不同W含量的Zr1-xWxN(x=0.17，0.28，0.36，0.44，0.49)复合膜，利用扫描电镜、能谱仪、X射线衍射仪、纳米压痕仪和摩擦磨损试验机研究该复合薄膜的微结构、力学性能及摩擦性能，并探讨ZrWN复合膜的摩擦机理。结果表明：当x≤0.28时，复合膜呈fcc(Zr,W)N结构；当x为0.36~0.44时，复合膜呈fcc(Zr,W)N和fcc W2N结构；当x=0.49时复合膜为fcc(Zr，W)N、fcc W2N结构和β-W单质。Zr1-xWxN复合膜的硬度随x增加先增大后减小，当x=0.44时达到最大值，为36.0 GPa。随x增加， Zr1-xWxN复合膜的室温摩擦因数先减小后增大，摩擦表面生成的氧化物WO3对于降低摩擦因数起重要作用。
채용반응자공천사법분별재단정규(100)화불수강기저상침적불동W함량적Zr1-xWxN(x=0.17，0.28，0.36，0.44，0.49)복합막，이용소묘전경、능보의、X사선연사의、납미압흔의화마찰마손시험궤연구해복합박막적미결구、역학성능급마찰성능，병탐토ZrWN복합막적마찰궤리。결과표명：당x≤0.28시，복합막정fcc(Zr,W)N결구；당x위0.36~0.44시，복합막정fcc(Zr,W)N화fcc W2N결구；당x=0.49시복합막위fcc(Zr，W)N、fcc W2N결구화β-W단질。Zr1-xWxN복합막적경도수x증가선증대후감소，당x=0.44시체도최대치，위36.0 GPa。수x증가， Zr1-xWxN복합막적실온마찰인수선감소후증대，마찰표면생성적양화물WO3대우강저마찰인수기중요작용。
Zr1-xWxN(x=0.17, 0.28, 0.36, 0.44, 0.49) composite films with different W contents were fabricated on wafers of silicon (100) and stainless steel by reactive magnetron sputtering technique. The microstructure, mechanical properties and friction properties were investigated by SEM-EDS analysis, X-ray diffraction, nano-indentation and high-temperature ball-on-disc tribo-meter. Tribological mechanism of ZrWN films was discussed. The results show that when x is no more than 0.28 in the film, the films exhibit fcc (Zr, W)N structure. When x is between 0.36 and 0.44, the films have a structure comprising fcc (Zr, W) N and fcc W2N. When x is 0.49, pureβ-W appears. The hardness of the Zr1-xWxN films increases and then decreases with increasing x. The maximum value is 36.0 GPa when x is 0.44. At room temperature, the friction coefficient of the Zr1-xWxN films shows down-up curve with increasing x. Oxide WO3 plays an important role in the friction process.