CAJ | 학술논문

采用等离子束溅射轰击刻蚀和溴甲醇腐蚀对CdTe薄膜表面进行后处理．对比研究了2种腐蚀条件下CdTe薄膜的光谱特性．结果表明：等离子束溅射轰击刻蚀可以彻底清除CdTe薄膜表面的氧化层，刻蚀后的CdTe薄膜颗粒更为均匀致密，等离子体刻蚀与溴甲醇腐蚀相比，可以改善CdTe薄膜表面的粗糙度，增强薄膜的附着力，改善薄膜的性能．
채용등리자속천사굉격각식화추갑순부식대CdTe박막표면진행후처리．대비연구료2충부식조건하CdTe박막적광보특성．결과표명：등리자속천사굉격각식가이철저청제CdTe박막표면적양화층，각식후적CdTe박막과립경위균균치밀，등리자체각식여추갑순부식상비，가이개선CdTe박막표면적조조도，증강박막적부착력，개선박막적성능．
The surface of CdTe thin films was etched by plasma bombardment sputtering and corroded by methyl bromide. The two types of spectnam properties of CdTe thin films were compared under the two con- ditions. The results show that plasma bombardment sputtering can remove the surface oxide layer completely and make the partiches of the thin films more even and compact, which show that compared with methyl bromide corrosion, it can improve micro-roughness of the surface and improve the quality of the crystal par- ticles and the adhesion of the film.