高校地质学报
高校地質學報
고교지질학보
GEOLOGICAL JOURNAL OF CHINA UNIVERSITIES
2013年
3期
456-462
,共7页
孙义程%周会群%尹坤%黄倩%徐士进
孫義程%週會群%尹坤%黃倩%徐士進
손의정%주회군%윤곤%황천%서사진
Morse stretch势场%自扩散系数%SiO2%分子动力学
Morse stretch勢場%自擴散繫數%SiO2%分子動力學
Morse stretch세장%자확산계수%SiO2%분자동역학
morse stretch potential%self-diffusion coefficient%SiO2%molecular dynamics
研究地幔熔体中元素的扩散性质有着重要的意义,因其影响着元素的交换和分馏过程。SiO2作为地幔组成的重要组分之一,其物理化学行为对于地幔动力学过程有着重要的意义。本文研究了SiO2熔体中元素的扩散机制和自扩散系数与压力的关系,采用Morse stretch势场对含有4500个原子的熔融SiO2体系进行了分子动力学模拟,计算了硅氧自扩散系数在3000 K温度下随压力的变化。模拟结果显示,在0.0001~40 GPa的压力区间,硅氧元素的自扩散系数均先上升后下降,在17.5 GPa时达到最大值,O原子的扩散速率略高于Si原子。硅氧元素的扩散方式为缺陷控制运移机制,其中硅原子的五配位结构的形成是关键,为导致扩散系数随压力增大而上升的主要原因,扩散系数的最大值意味着SiO2熔体中5配位硅形成机制的改变。本文也计算了单位[SiO2]的平均体积和压力的关系,结果与实验很吻合。
研究地幔鎔體中元素的擴散性質有著重要的意義,因其影響著元素的交換和分餾過程。SiO2作為地幔組成的重要組分之一,其物理化學行為對于地幔動力學過程有著重要的意義。本文研究瞭SiO2鎔體中元素的擴散機製和自擴散繫數與壓力的關繫,採用Morse stretch勢場對含有4500箇原子的鎔融SiO2體繫進行瞭分子動力學模擬,計算瞭硅氧自擴散繫數在3000 K溫度下隨壓力的變化。模擬結果顯示,在0.0001~40 GPa的壓力區間,硅氧元素的自擴散繫數均先上升後下降,在17.5 GPa時達到最大值,O原子的擴散速率略高于Si原子。硅氧元素的擴散方式為缺陷控製運移機製,其中硅原子的五配位結構的形成是關鍵,為導緻擴散繫數隨壓力增大而上升的主要原因,擴散繫數的最大值意味著SiO2鎔體中5配位硅形成機製的改變。本文也計算瞭單位[SiO2]的平均體積和壓力的關繫,結果與實驗很吻閤。
연구지만용체중원소적확산성질유착중요적의의,인기영향착원소적교환화분류과정。SiO2작위지만조성적중요조분지일,기물이화학행위대우지만동역학과정유착중요적의의。본문연구료SiO2용체중원소적확산궤제화자확산계수여압력적관계,채용Morse stretch세장대함유4500개원자적용융SiO2체계진행료분자동역학모의,계산료규양자확산계수재3000 K온도하수압력적변화。모의결과현시,재0.0001~40 GPa적압력구간,규양원소적자확산계수균선상승후하강,재17.5 GPa시체도최대치,O원자적확산속솔략고우Si원자。규양원소적확산방식위결함공제운이궤제,기중규원자적오배위결구적형성시관건,위도치확산계수수압력증대이상승적주요원인,확산계수적최대치의미착SiO2용체중5배위규형성궤제적개변。본문야계산료단위[SiO2]적평균체적화압력적관계,결과여실험흔문합。
The diffusivity of elements in mineral controls the processes of ion exchange, isotope fractionation, and phase transition. As one of the most important components of silicate melts, SiO2 plays a very important role in the earth mantle structure and the dynamics process. This paper focuses on the ion diffusion mechanism in silica melt and the corresponding pressure when the self-diffusion coefficient reaches its maximum value. We calculated the changing process of Si and O ions, self-diffusion coefficient at temperatures of 3000 K by using the molecular dynamics (MD) simulation which contains 4500 ions in the silica melt with Morse stretch potential. Calculations show that both Si and O self-diffusion coefficients increase at initial compression and reach maximum values at 17.5 GPa. Self-diffusion coefficients for O are slightly greater than that for Si. The Si and O ions , diffusion feature is caused by a defect-controlled transport mechanism and the five-fold coordination structure of Si ion is the main reason for the rise of the diffusion coefficients in accord with the increasing pressure. The fact that the diffusion coefficient reaches its maximum value means the change in the formation of five-fold Si in the liquid silica. This paper also calculated the relationship between the average volume of [SiO2] unit and the pressure, which agrees well with the results of our experiment.