电子工业专用设备
電子工業專用設備
전자공업전용설비
EQUIPMENT FOR ELECTRONIC PRODUCTS MANUFACTURING
2012年
7期
36-39
,共4页
锗单晶%悬浮区熔%纯度%位错
鍺單晶%懸浮區鎔%純度%位錯
타단정%현부구용%순도%위착
Germanium crystal%Floating zone method%Purity%Dislocation
采用悬浮区熔工艺,生长出了最大直径(等径部分)22 mm的〈100〉晶向锗单晶,单晶等径长度20 mm,总长度80 mm。为减小锗单晶生长中的重力作用,并提高温度梯度以增强结晶趋动力,特别设计了锗单晶生长用的加热线圈,包括设计线圈的内径为18 mm,线圈的下表面设计为0°的平角,上表面设计成9°的锥形等。改进后的加热线圈有效地减小了熔体的质量,消除了熔体因重力作用而引起的下坠及因下坠而在上界面形成的无法熔化的腰带。实验表明,锗单晶生长对功率变化非常敏感,生长过程中极易引入位错,但在有大量位错的情况下,晶棱能依然保持完好。
採用懸浮區鎔工藝,生長齣瞭最大直徑(等徑部分)22 mm的〈100〉晶嚮鍺單晶,單晶等徑長度20 mm,總長度80 mm。為減小鍺單晶生長中的重力作用,併提高溫度梯度以增彊結晶趨動力,特彆設計瞭鍺單晶生長用的加熱線圈,包括設計線圈的內徑為18 mm,線圈的下錶麵設計為0°的平角,上錶麵設計成9°的錐形等。改進後的加熱線圈有效地減小瞭鎔體的質量,消除瞭鎔體因重力作用而引起的下墜及因下墜而在上界麵形成的無法鎔化的腰帶。實驗錶明,鍺單晶生長對功率變化非常敏感,生長過程中極易引入位錯,但在有大量位錯的情況下,晶稜能依然保持完好。
채용현부구용공예,생장출료최대직경(등경부분)22 mm적〈100〉정향타단정,단정등경장도20 mm,총장도80 mm。위감소타단정생장중적중력작용,병제고온도제도이증강결정추동력,특별설계료타단정생장용적가열선권,포괄설계선권적내경위18 mm,선권적하표면설계위0°적평각,상표면설계성9°적추형등。개진후적가열선권유효지감소료용체적질량,소제료용체인중력작용이인기적하추급인하추이재상계면형성적무법용화적요대。실험표명,타단정생장대공솔변화비상민감,생장과정중겁역인입위착,단재유대량위착적정황하,정릉능의연보지완호。
The germanium crystal with diameter 22 mm and 20 mm long has been gown. by floating zone (FZ) method. The grown crystal is with 〈100〉 orientation and a total length of 80 mm. As the germanium melt is more than twice as dense as liquid silicon, to decrease the weight effect of the melt and to increase the temperature gradient in the crystal growth process, a new induction coil with a fiat bottom side, a conical upper side of 9° and a hole diameter of 18 mm was built. With this induction coil to grow germanium crystal, the mass of the melt is reduced effectively and the melt sinkage as well as the waistband which is difficult to melt is avoided. The experiment result shows that the crystallization phase boundary is very sensitive to power fluctuations and the dislocation is easy to form. in germanium single crystal growth. However, when large quantities of dislocation exist in the crystal the crystal ridge can still keep clear.