电子工业专用设备
電子工業專用設備
전자공업전용설비
EQUIPMENT FOR ELECTRONIC PRODUCTS MANUFACTURING
2012年
8期
7-10
,共4页
单晶炉%热屏装置%密闭式热场%棒体扭曲变形
單晶爐%熱屏裝置%密閉式熱場%棒體扭麯變形
단정로%열병장치%밀폐식열장%봉체뉴곡변형
Single crystal crowth furnace%Heat shield%Closed heat zone%Distortion EEACC
在CG6000型单晶炉原350 mm（14英寸）敞开式热场上添加具有保温和导流作用的热屏装置,并改进计算机自动控制参数,解决了原敞开式热场下硅单晶拉制过程中产生扭曲变形的问题,生长出了外形完好,高质量的〈111〉晶向75～80 mm（3英寸和4英寸）硅单晶。同时对敞开式热场下硅单晶棒体扭曲变形的原因及热屏装置对硅单晶生长区域温度分布和温度梯度的影响进行了分析和探讨。
在CG6000型單晶爐原350 mm（14英吋）敞開式熱場上添加具有保溫和導流作用的熱屏裝置,併改進計算機自動控製參數,解決瞭原敞開式熱場下硅單晶拉製過程中產生扭麯變形的問題,生長齣瞭外形完好,高質量的〈111〉晶嚮75～80 mm（3英吋和4英吋）硅單晶。同時對敞開式熱場下硅單晶棒體扭麯變形的原因及熱屏裝置對硅單晶生長區域溫度分佈和溫度梯度的影響進行瞭分析和探討。
재CG6000형단정로원350 mm（14영촌）창개식열장상첨가구유보온화도류작용적열병장치,병개진계산궤자동공제삼수,해결료원창개식열장하규단정랍제과정중산생뉴곡변형적문제,생장출료외형완호,고질량적〈111〉정향75～80 mm（3영촌화4영촌）규단정。동시대창개식열장하규단정봉체뉴곡변형적원인급열병장치대규단정생장구역온도분포화온도제도적영향진행료분석화탐토。
In this paper wo found a good solution to improve the problem of twist and distortion during the process of silicon crystal growth by designing and introducing the heat shield to the opened heat system in the CG6000 cystal grower ,We also developed the parameter of the program to automatic control the process of crystal growth. We got 3 and 4 inchs 〈111〉 orientation silicon crystal without twist and distortion problem.Then we researched and analysed the reasons of twist and distortion problems ,finally we analysed the differents in temperature distribution and temperature gradient between opened heat system and closed heat system.
