爆破器材
爆破器材
폭파기재
2013年
6期
1-6
,共6页
付帅%朱朋%叶迎华%李东乐%沈瑞琪
付帥%硃朋%葉迎華%李東樂%瀋瑞琪
부수%주붕%협영화%리동악%침서기
Al/MoOx 纳米复合薄膜%含能半导体桥%点火起爆特性%等离子体测温
Al/MoOx 納米複閤薄膜%含能半導體橋%點火起爆特性%等離子體測溫
Al/MoOx 납미복합박막%함능반도체교%점화기폭특성%등리자체측온
Al/MoOxnano multilayer films%Energetic semiconductor bridge%Ignition character%Plasma temperature
使用微细加工和磁控溅射技术将Al/MoO x 纳米复合薄膜集成于半导体桥( SCB ),制成含能半导体桥SCB-Al/MoO x 以提高SCB的点火能力。薄膜的SEM、DCS和XPS结果表明,复合薄膜成膜质量好,层状结构清晰,放热量可达3200 J/g,达到理论值的68%(理论放热量为4703 J/g),MoOx 薄膜含有32%的MoO3、37%的Mo2O5以及31%的MoO2。电容激励发火实验表明:相同激发条件下, SCB-Al/MoOx 反应终止时间较SCB显著缩短,能量输出效率高于SCB ,发火时溅射出的火花量明显增多,持续时间显著延长,使用原子发射双谱线测温法得到的等离子体温度亦高于SCB。
使用微細加工和磁控濺射技術將Al/MoO x 納米複閤薄膜集成于半導體橋( SCB ),製成含能半導體橋SCB-Al/MoO x 以提高SCB的點火能力。薄膜的SEM、DCS和XPS結果錶明,複閤薄膜成膜質量好,層狀結構清晰,放熱量可達3200 J/g,達到理論值的68%(理論放熱量為4703 J/g),MoOx 薄膜含有32%的MoO3、37%的Mo2O5以及31%的MoO2。電容激勵髮火實驗錶明:相同激髮條件下, SCB-Al/MoOx 反應終止時間較SCB顯著縮短,能量輸齣效率高于SCB ,髮火時濺射齣的火花量明顯增多,持續時間顯著延長,使用原子髮射雙譜線測溫法得到的等離子體溫度亦高于SCB。
사용미세가공화자공천사기술장Al/MoO x 납미복합박막집성우반도체교( SCB ),제성함능반도체교SCB-Al/MoO x 이제고SCB적점화능력。박막적SEM、DCS화XPS결과표명,복합박막성막질량호,층상결구청석,방열량가체3200 J/g,체도이론치적68%(이론방열량위4703 J/g),MoOx 박막함유32%적MoO3、37%적Mo2O5이급31%적MoO2。전용격려발화실험표명:상동격발조건하, SCB-Al/MoOx 반응종지시간교SCB현저축단,능량수출효솔고우SCB ,발화시천사출적화화량명현증다,지속시간현저연장,사용원자발사쌍보선측온법득도적등리자체온도역고우SCB。
An energetic semiconductor bridge, SCB-Al/MoOx, was made using Al/MoOx nano multilayer films integrated with semiconductor bridge ( SCB ) by micro machining technology and magnetron sputtering technology , and accordingly its ignition capacity was enhanced .The Al/MoOx films were identified by SEM , DSC and XPS.Results show that distinct Al/MoOx multilayer films are formed by means of sputter deposited on a layered geometry .The heat generation could reach to 3200 J/g, which is 68%of the theoretical value (4703 J/g).MoOx films contain MoO3(32%), Mo2O5 (37%) and MoO2(31%), respectively.In capacitance triggered firing experiments , the terminal time of SCB-Al/MoOx reaction is shorter , while the energy output efficiency is higher than those of SCB .Moreover, sparks in the fire increase obviously, and their duration time is extended .The exothermic reactions in Al/MoOx films sustain SCB to generate plasma of higher temperatures .