CAJ | 학술논문

为了研究纳米结构金属Ti的纳米力学性能，在偏压为0~140 V的范围内，采用磁控溅射方法制备纯钛薄膜。并采用X射线衍射仪(XRD)、扫描电子显微镜(SEM)和高分辨率透射电子显微镜(HRTEM)表征钛薄膜的显微组织。结果表明：钛薄膜呈现非晶与纳米晶的混合结构，且晶化程度随着偏压的升高而增大。纳米压痕测试结果表明：钛薄膜的硬度与晶粒尺寸在6~15 nm的范围内符合Hall-Petch关系。但其Hall-Petch关系的斜率与采用其他强烈塑性变形法制备的超细晶纯钛相比，明显偏小，且呈现软化趋势。此外，讨论偏压对钛薄膜生长取向的影响。
위료연구납미결구금속Ti적납미역학성능，재편압위0~140 V적범위내，채용자공천사방법제비순태박막。병채용X사선연사의(XRD)、소묘전자현미경(SEM)화고분변솔투사전자현미경(HRTEM)표정태박막적현미조직。결과표명：태박막정현비정여납미정적혼합결구，차정화정도수착편압적승고이증대。납미압흔측시결과표명：태박막적경도여정립척촌재6~15 nm적범위내부합Hall-Petch관계。단기Hall-Petch관계적사솔여채용기타강렬소성변형법제비적초세정순태상비，명현편소，차정현연화추세。차외，토론편압대태박막생장취향적영향。
In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HRTEM). It is interesting to find that the microstructure of pure Ti films was characterized by the composite structure of amorphous-like matrix embodied with nanocrystallines, and the crystallization was improved with the increase of bias voltage. The hardness of Ti films measured by nanoindentation tests shows a linear relationship with grain sizes in the scale of 6-15 nm. However, the pure Ti films exhibit a soft tendency characterized by a smaller slope of Hall-Petch relationship. In addition, the effect of bias voltage on the growth orientation of Ti films was discussed.