CAJ | 학술논문

采用反应非平衡磁控溅射技术在青铜及Si(100)衬底上沉积不同负偏压(Vb)的纳米ZrNbAlN薄膜。薄膜结构及成分采用X射线光电子能谱及X射线衍射进行表征。结果表明，Zr和Nb的原子浓度受负偏压影响，V b导致N 1s谱和Al 2p谱的结合能增加及Zr 3d 5/2和Nb 3d 5/2谱的结合能降低，薄膜表面形貌的演化受控于V b。X射线衍射谱显示这些薄膜具有(111)择优取向。此外，薄膜的力学特性及腐蚀行为分别通过纳米压痕测试及腐蚀测试表征。当负偏压为-70 V时，纳米压痕测试显示的最大显微硬度为21.85 GPa，ZrNbAlN膜在青铜衬底上的性能远优于未涂层处理的衬底。在0.5 mol/L NaCl和0.5 mol/L HCl溶液中的腐蚀实验表明，腐蚀势能及腐蚀电流依赖于衬底偏压，在-90 V时能够获得较高的抗腐蚀特性。
채용반응비평형자공천사기술재청동급Si(100)츤저상침적불동부편압(Vb)적납미ZrNbAlN박막。박막결구급성분채용X사선광전자능보급X사선연사진행표정。결과표명，Zr화Nb적원자농도수부편압영향，V b도치N 1s보화Al 2p보적결합능증가급Zr 3d 5/2화Nb 3d 5/2보적결합능강저，박막표면형모적연화수공우V b。X사선연사보현시저사박막구유(111)택우취향。차외，박막적역학특성급부식행위분별통과납미압흔측시급부식측시표정。당부편압위-70 V시，납미압흔측시현시적최대현미경도위21.85 GPa，ZrNbAlN막재청동츤저상적성능원우우미도층처리적츤저。재0.5 mol/L NaCl화0.5 mol/L HCl용액중적부식실험표명，부식세능급부식전류의뢰우츤저편압，재-90 V시능구획득교고적항부식특성。
Nano-scaled ZrNbAlN films with different negative bias voltages (Vb) were deposited on bronze substrate and Si (100) wafers by a reactive unbalanced magnetron sputtering technique. Composition and structure properties were characterized by X-ray photoelectron spectroscopy and X-ray diffraction. It is found that mole concentrations of Zr and Nb are affected by Vb, which leads to the increase of binding energy of N 1s and Al 2p and decrease of binding energy of Zr 3d5/2 and Nb 3d5/2. Surface morphologies evolution controlled by Vb could be observed. Furthermore, X-ray diffraction patterns reveal that these films show a (111) preferred orientation. Moreover, mechanical property and corrosion behavior of ZrNbAlN films were characterized by nanoindentation test and corrosion test, respectively. A maximum value of 21.85 GPa at-70 V occurs in the ZrNbAlN-bronze system, which outperforms uncoated bronze. Corrosion experiments in 0.5 mol/L NaCl and 0.5 mol/L HCl solution show that corrosion potential and corrosion current are dependent on Vb, and better anti-corrosion property could be obtained at-90 V.