CAJ | 학술논문

以磁控溅射法沉积在单晶硅片上的钛薄膜样品为工作电极，以循环伏安法为阳极氧化方式，研究极低电位下钛表面氧化膜的生长与结晶行为。通过AFM、SE和XPS等手段表征钛表面阳极氧化膜的表面形貌、结晶性和化学组成。结果表明，即使在低至1000 mV的电位下，所形成的阳极氧化钛薄膜也是结晶的，而不是无定型的。升高氧化电位或者降低电位扫描速率都有利于钛氧化膜的形成和结晶。认为，在极低的电位下，产生于氧化膜/金属界面的内在压应力是导致钛氧化物结晶形成的主要原因，而不是被研究者们所普遍接受的焦耳热。
이자공천사법침적재단정규편상적태박막양품위공작전겁，이순배복안법위양겁양화방식，연구겁저전위하태표면양화막적생장여결정행위。통과AFM、SE화XPS등수단표정태표면양겁양화막적표면형모、결정성화화학조성。결과표명，즉사재저지1000 mV적전위하，소형성적양겁양화태박막야시결정적，이불시무정형적。승고양화전위혹자강저전위소묘속솔도유리우태양화막적형성화결정。인위，재겁저적전위하，산생우양화막/금속계면적내재압응력시도치태양화물결정형성적주요원인，이불시피연구자문소보편접수적초이열。
Growth and crystallization of titanium anodized films were studied by performing the anodization of the sputter-deposited titanium samples under cyclic voltammetry (CV) mode at very low potentials. The surface features, crystalline behaviors and chemical compositions of the formed anodic oxide layers were detected by AFM, SE and XPS. It was found that the structure of the titanium anodized films is crystalline, even though the maximum oxidation potential (φmax) is very low (as low as 1000 mV). Both enlarging the applied voltage and reducing the potential scanning rate are beneficial for the growth and crystallization of titanium oxide films. It was thought that the internal compressive stress, other than the local joule heating accepted for many researchers, is the main force of stimulating the crystallization of anodic titanium oxide films at very low potentials.