新技术新工艺
新技術新工藝
신기술신공예
NEW TECHNOLOGY & NEW PROCESS
2013年
11期
89-92
,共4页
侯蔚%丁运虎%李家柱%毛祖国%孙宁%韩方丁
侯蔚%丁運虎%李傢柱%毛祖國%孫寧%韓方丁
후위%정운호%리가주%모조국%손저%한방정
硫酸盐体系%三价铬硬铬电镀%活性配位体%催化剂
硫痠鹽體繫%三價鉻硬鉻電鍍%活性配位體%催化劑
류산염체계%삼개락경락전도%활성배위체%최화제
sulfate electrolyte%trivalent black chromium plating%active ligands%catalysts
通过赫尔槽试验、小槽试验和中试试验,确定了硫酸盐体系三价铬硬铬电镀溶液活性配位体和催化剂的组成和含量,以及镀液的工艺规范,并对镀液和镀层性能进行了测试。结果表明,镀液稳定性好,电流密度范围可达35~50 A/dm2,电流效率为29.8%~34.1%,镀层接合力优良,外观均匀白亮,厚度>40μm,硬度达到996.5 HV,中性盐雾试验>200 h。
通過赫爾槽試驗、小槽試驗和中試試驗,確定瞭硫痠鹽體繫三價鉻硬鉻電鍍溶液活性配位體和催化劑的組成和含量,以及鍍液的工藝規範,併對鍍液和鍍層性能進行瞭測試。結果錶明,鍍液穩定性好,電流密度範圍可達35~50 A/dm2,電流效率為29.8%~34.1%,鍍層接閤力優良,外觀均勻白亮,厚度>40μm,硬度達到996.5 HV,中性鹽霧試驗>200 h。
통과혁이조시험、소조시험화중시시험,학정료류산염체계삼개락경락전도용액활성배위체화최화제적조성화함량,이급도액적공예규범,병대도액화도층성능진행료측시。결과표명,도액은정성호,전류밀도범위가체35~50 A/dm2,전류효솔위29.8%~34.1%,도층접합력우량,외관균균백량,후도>40μm,경도체도996.5 HV,중성염무시험>200 h。
The composition and concentration including active ligands,catalysts,and the electroplating,process specifi-cations of the hard trivalent chromium sulfate electrolyte were determined by Hull Cell tests,electroplating simulated tests and pilot tests.The properties of the electroplating bathes and the deposits were also measured.The results showed that the process had the advantages of high stabilization,range of current density was up to 35 ~50 A/dm2 ,current efficiency was up to 29.8%~34.1%,the deposit had quality adhesive strength,appearance of uniform bright white,thickness reached more than 40 μm,hardness was up to 996.5 HV,neutral salt spray test reached more than 200 h.