中国环境科学
中國環境科學
중국배경과학
CHINA ENVIRONMENTAL SCIENCE
2014年
6期
1442-1447
,共6页
硒酸盐%氢基质生物膜反应器%硝酸盐%硫酸盐
硒痠鹽%氫基質生物膜反應器%硝痠鹽%硫痠鹽
서산염%경기질생물막반응기%초산염%류산염
selenate%hydrogen-based membrane biofilm reactor%nitrate%sulfate
利用连续搅拌氢基质生物膜反应器研究氢气(H2)分压,NO3--N,SO42-,SeO42-进水浓度对水中硒酸盐去除效果的影响.结果表明,H2分压是水中氧化态污染物 NO3-,SO42-,SeO42-去除效果的重要影响因素,随着 H2分压从0.02MPa 上升到0.08MPa,SO42-的去除率从3.5%上升到46.3%,总Se的去除率从60.7%上升到82.1%,NO3-全过程都完全被还原为N2；随着NO3--N进水浓度从5mg/L增加到50mg/L,SO42-,SeO42-的去除率逐渐下降至0,并出现 NO2-的积累；SO42-进水浓度的增加对 NO3-,SeO42-去除效果影响不大,去除率分别保持在99.5%和65%以上,三种氧化态污染物得电子的优先级为NO3->SeO42->SO42-.在NO3--N浓度为10mg/L,SO42-浓度为25mg/L的水质条件下,反应器设置H2分压为0.04MPa,进水Se(VI)浓度在0.25~2mg/L的范围内总Se可以取得80%以上的去除效果.
利用連續攪拌氫基質生物膜反應器研究氫氣(H2)分壓,NO3--N,SO42-,SeO42-進水濃度對水中硒痠鹽去除效果的影響.結果錶明,H2分壓是水中氧化態汙染物 NO3-,SO42-,SeO42-去除效果的重要影響因素,隨著 H2分壓從0.02MPa 上升到0.08MPa,SO42-的去除率從3.5%上升到46.3%,總Se的去除率從60.7%上升到82.1%,NO3-全過程都完全被還原為N2；隨著NO3--N進水濃度從5mg/L增加到50mg/L,SO42-,SeO42-的去除率逐漸下降至0,併齣現 NO2-的積纍；SO42-進水濃度的增加對 NO3-,SeO42-去除效果影響不大,去除率分彆保持在99.5%和65%以上,三種氧化態汙染物得電子的優先級為NO3->SeO42->SO42-.在NO3--N濃度為10mg/L,SO42-濃度為25mg/L的水質條件下,反應器設置H2分壓為0.04MPa,進水Se(VI)濃度在0.25~2mg/L的範圍內總Se可以取得80%以上的去除效果.
이용련속교반경기질생물막반응기연구경기(H2)분압,NO3--N,SO42-,SeO42-진수농도대수중서산염거제효과적영향.결과표명,H2분압시수중양화태오염물 NO3-,SO42-,SeO42-거제효과적중요영향인소,수착 H2분압종0.02MPa 상승도0.08MPa,SO42-적거제솔종3.5%상승도46.3%,총Se적거제솔종60.7%상승도82.1%,NO3-전과정도완전피환원위N2；수착NO3--N진수농도종5mg/L증가도50mg/L,SO42-,SeO42-적거제솔축점하강지0,병출현 NO2-적적루；SO42-진수농도적증가대 NO3-,SeO42-거제효과영향불대,거제솔분별보지재99.5%화65%이상,삼충양화태오염물득전자적우선급위NO3->SeO42->SO42-.재NO3--N농도위10mg/L,SO42-농도위25mg/L적수질조건하,반응기설치H2분압위0.04MPa,진수Se(VI)농도재0.25~2mg/L적범위내총Se가이취득80%이상적거제효과.
A continuous stirred hydrogen-based membrane biofilm reactor (CS-MBfR) was used to investigate the effects of the H2 pressure and the influent concentrations of NO3-, SO42- and SeO42- on the removal of SeO42- from aqueous solution. As the experiment results showed, H2 pressure was a key factor influencing the removal of NO3-, SO42- and SeO42-. With the increase of H2pressure from 0.02MPa to 0.08MPa, the removal rates of SO42-and total Se increased from 3.5% and 60.7% to 46.3% and 2.1%, respectively, while NO3- was completely reduced to N2 throughout the process. When influent NO3-concentration increased from 5 to 50mg/L, the removal rates of SO42-and SeO42-gradually decreased to 0, and the NO2- accumulation was observed. The removal of NO3-and SeO42-was not affected by increasing influent SO42-concentration, and their removal rates were above 99.5%and 65%, respectively. The priority sequence of electron accepting ability is NO3->SeO42->SO42-. Under the conditions of H2 pressure 0.04MPa, NO3-10mg/L, SO42-25mg/L, and Se (VI) 0.25~2mg/L, the removal rate of total Se was above 80%.
