中国光学
中國光學
중국광학
CHINESE JOURNAL OF OPTICS
2013年
6期
900-905
,共6页
薄膜材料%激光防护膜%折射率%掺杂%双源共蒸
薄膜材料%激光防護膜%摺射率%摻雜%雙源共蒸
박막재료%격광방호막%절사솔%참잡%쌍원공증
thin film material%laser protective coating%refractive index%doping%co-evaporation
根据太阳电池阵激光防护膜性能优化的需要,应用离子辅助电子束双源共蒸工艺方法制备了优化设计所需的特定折射率的薄膜材料并用于制备激光防护膜。测试结果显示:用该工艺方法制备的掺杂材料薄膜的折射率n=1.75,与优化设计所需数值相符;激光防护膜性能优良,太阳辐射能透过率提高6%以上,实现了对该激光防护膜性能的进一步优化。为了使该双源共蒸方法适于大面积薄膜的制备,应用均匀性挡板技术来提高该方法制备大面积薄膜的膜厚均匀性,使制备的掺杂材料薄膜在口径为400 mm时的不均匀性小于2.1%。该双源共蒸方法制备工艺简单、可靠,适于实际工程应用。薄膜性能测试结果与理论优化结果相符,达到预期优化目标。
根據太暘電池陣激光防護膜性能優化的需要,應用離子輔助電子束雙源共蒸工藝方法製備瞭優化設計所需的特定摺射率的薄膜材料併用于製備激光防護膜。測試結果顯示:用該工藝方法製備的摻雜材料薄膜的摺射率n=1.75,與優化設計所需數值相符;激光防護膜性能優良,太暘輻射能透過率提高6%以上,實現瞭對該激光防護膜性能的進一步優化。為瞭使該雙源共蒸方法適于大麵積薄膜的製備,應用均勻性擋闆技術來提高該方法製備大麵積薄膜的膜厚均勻性,使製備的摻雜材料薄膜在口徑為400 mm時的不均勻性小于2.1%。該雙源共蒸方法製備工藝簡單、可靠,適于實際工程應用。薄膜性能測試結果與理論優化結果相符,達到預期優化目標。
근거태양전지진격광방호막성능우화적수요,응용리자보조전자속쌍원공증공예방법제비료우화설계소수적특정절사솔적박막재료병용우제비격광방호막。측시결과현시:용해공예방법제비적참잡재료박막적절사솔n=1.75,여우화설계소수수치상부;격광방호막성능우량,태양복사능투과솔제고6%이상,실현료대해격광방호막성능적진일보우화。위료사해쌍원공증방법괄우대면적박막적제비,응용균균성당판기술래제고해방법제비대면적박막적막후균균성,사제비적참잡재료박막재구경위400 mm시적불균균성소우2.1%。해쌍원공증방법제비공예간단、가고,괄우실제공정응용。박막성능측시결과여이론우화결과상부,체도예기우화목표。
A material with specific refractive index is prepared according to the requirement for the preparation of the laser protective coating for solar arrays .In this method , we apply the electron beam co-evaporation tech-nique based on doped material preparation methods .Tests show that the refractive index of the doped material is 1.75 , according with the result of optimized scheme .The material is then used in the preparation of optical thin films to achieve a further optimization of the laser protective coating properties .Obtained laser protective coating has excellent properties and its solar radiation transmittance is increased by more than 6%.The film thickness mask technology is applied to improve the film thickness uniformity of large area thin films prepared by co-evaporation method .The thickness nonuniformity of doped material film prepared by this method withinΦ400 mm area is less than 2.1%.It is showed that the technical process of electron beam co-evaporation technique is simple , reliable and suitable for practical applications .Test results of the film performance are consistent with the theoretical optimized results .