机床与液压
機床與液壓
궤상여액압
MACHINE TOOL & HYDRAULICS
2013年
21期
19-22
,共4页
二维微动工作台%纳米定位%定位误差%反相法
二維微動工作檯%納米定位%定位誤差%反相法
이유미동공작태%납미정위%정위오차%반상법
Two-dimension micro displacement stage%Nano-positioning%Positioning error%Reversed phase method
随着科学技术的发展,超精密定位技术在各领域得到了广泛应用,它的研究对MEMS技术的发展具有重要的意义。对具有纳米定位精度的二维微动工作台的定位误差进行研究。首先,对分辨率为0.15 nm的双频激光干涉仪进行了测量误差分析,其标定二维微动工作台时的测量精度为14.4 nm;利用该激光干涉仪标定时温漂的近线性关系去除了定位误差中的综合误差,采用反相补偿法对定位误差中的系统误差进行了补偿。测得该工作台补偿前的定位误差在250~300 nm之间,在空气弹簧隔振平台上进行了误差补偿实验,测得补偿后两轴的定位误差分别为20 nm和25 nm左右。实验证明了该种方法用于补偿纳米定位系统的可行性。
隨著科學技術的髮展,超精密定位技術在各領域得到瞭廣汎應用,它的研究對MEMS技術的髮展具有重要的意義。對具有納米定位精度的二維微動工作檯的定位誤差進行研究。首先,對分辨率為0.15 nm的雙頻激光榦涉儀進行瞭測量誤差分析,其標定二維微動工作檯時的測量精度為14.4 nm;利用該激光榦涉儀標定時溫漂的近線性關繫去除瞭定位誤差中的綜閤誤差,採用反相補償法對定位誤差中的繫統誤差進行瞭補償。測得該工作檯補償前的定位誤差在250~300 nm之間,在空氣彈簧隔振平檯上進行瞭誤差補償實驗,測得補償後兩軸的定位誤差分彆為20 nm和25 nm左右。實驗證明瞭該種方法用于補償納米定位繫統的可行性。
수착과학기술적발전,초정밀정위기술재각영역득도료엄범응용,타적연구대MEMS기술적발전구유중요적의의。대구유납미정위정도적이유미동공작태적정위오차진행연구。수선,대분변솔위0.15 nm적쌍빈격광간섭의진행료측량오차분석,기표정이유미동공작태시적측량정도위14.4 nm;이용해격광간섭의표정시온표적근선성관계거제료정위오차중적종합오차,채용반상보상법대정위오차중적계통오차진행료보상。측득해공작태보상전적정위오차재250~300 nm지간,재공기탄황격진평태상진행료오차보상실험,측득보상후량축적정위오차분별위20 nm화25 nm좌우。실험증명료해충방법용우보상납미정위계통적가행성。
Along with the development of science and technology,the ultra-precision positioning technology has been widely ap-plied in various fields,and its research is of great significance for the development of Micro-electromechanical Systems (MEMS)tech-nology. The research on compensation of positioning errors for two-dimension micro displacement stage with nano-positioning accuracy was aimed at. Firstly,the measurement error of two-frequency laser interferometer with resolution at 0.15 nm was analyzed,and the measuring accuracy was at 14.4 nm when it was calibrating the two-dimension micro displacement stage. The synthetic error in positio-ning errors by the approximately linear relationship of temperature drift when calibrating by using it was removed,and the systematic er-ror in positioning errors was compensated by reversed phase method. The error compensation experiments were done in the air spring platform,and it was found the measured positioning error of the stage,before compensation,was between 250~300 nm,then the posi-tioning errors of the two axes were measured separately within about 20 nm and 25 nm after compensation. The experiment proves the feasibility of the method used to compensate for nano-positioning system.