湖南文理学院学报（自然科学版）
湖南文理學院學報（自然科學版）
호남문이학원학보（자연과학판）
JOURNAL OF HUNAN UNIVERSITY OF ARTS AND SCIENCE(SCIENCE AND TECHNOLOGY)
2014年
2期
52-55,85
,共5页
龙永福%张晋平%胡惟文%雷立云%黎小琴
龍永福%張晉平%鬍惟文%雷立雲%黎小琴
룡영복%장진평%호유문%뢰립운%려소금
多孔硅%微结构%AFM%SEM%XRD
多孔硅%微結構%AFM%SEM%XRD
다공규%미결구%AFM%SEM%XRD
porous silicon%microstructures%AFM%SEM%XRD
使用扫描电子显微镜、原子力显微镜和X射线衍射研究了多孔硅薄膜的微结构. SEM图像显示：多孔硅膜表面的微结构比较均匀；沿纵向方向薄膜内部空腔呈流线型分布；孔和孔之间的间距为10～20 nm. AFM形貌表明：其表面在1×1μm范围内的均方根粗糙度为4.75 nm. XRD结果说明：多孔硅薄膜晶体晶格常数随深度增加而变大，多孔硅薄膜孔壁上Si-H键的比例将减少.
使用掃描電子顯微鏡、原子力顯微鏡和X射線衍射研究瞭多孔硅薄膜的微結構. SEM圖像顯示：多孔硅膜錶麵的微結構比較均勻；沿縱嚮方嚮薄膜內部空腔呈流線型分佈；孔和孔之間的間距為10～20 nm. AFM形貌錶明：其錶麵在1×1μm範圍內的均方根粗糙度為4.75 nm. XRD結果說明：多孔硅薄膜晶體晶格常數隨深度增加而變大，多孔硅薄膜孔壁上Si-H鍵的比例將減少.
사용소묘전자현미경、원자력현미경화X사선연사연구료다공규박막적미결구. SEM도상현시：다공규막표면적미결구비교균균；연종향방향박막내부공강정류선형분포；공화공지간적간거위10～20 nm. AFM형모표명：기표면재1×1μm범위내적균방근조조도위4.75 nm. XRD결과설명：다공규박막정체정격상수수심도증가이변대，다공규박막공벽상Si-H건적비례장감소.
This paper investigates the microstructures and X-ray diffraction (XRD) of nano-porous silicon (PS) thin films by means of scanning electron microscopy (SEM), Atomic Force Microscope (AFM) and X-ray diffraction (XRD). SEM images show the surface microstructures of PS thin films is better uniform. The distribution of the interior cavity along the longitudinal direction of the film is streamlined, and the spacing between the holes being about 10~20 nm. AFM image results show that the RMS (Root Mean Square) roughness is 4.75 nm in its inner surface on the range of 1 × 1μm. XRD r esults indicate:as the depth of PS film with a crystal lattice constant of the film becomes large, the pore walls of PS film of Si-H bond ratio will be reduced.
