电子工业专用设备
電子工業專用設備
전자공업전용설비
EQUIPMENT FOR ELECTRONIC PRODUCTS MANUFACTURING
2012年
12期
21-25
,共5页
接近式曝光%微小孔%近场衍射
接近式曝光%微小孔%近場衍射
접근식폭광%미소공%근장연사
proximity exposure%small aperture%near-field diffraction
阐述了微小孔近场衍射的基本理论。重点对单色光垂直入射时圆孔衍射场的光强空间分布进行了计算机数值模拟。通过对不同半径圆孔的衍射场光强进行仿真，分析得到了衍射场光强的空间分布特性。对接近式曝光技术参数的设定具有理论指导意义。
闡述瞭微小孔近場衍射的基本理論。重點對單色光垂直入射時圓孔衍射場的光彊空間分佈進行瞭計算機數值模擬。通過對不同半徑圓孔的衍射場光彊進行倣真，分析得到瞭衍射場光彊的空間分佈特性。對接近式曝光技術參數的設定具有理論指導意義。
천술료미소공근장연사적기본이론。중점대단색광수직입사시원공연사장적광강공간분포진행료계산궤수치모의。통과대불동반경원공적연사장광강진행방진，분석득도료연사장광강적공간분포특성。대접근식폭광기술삼수적설정구유이론지도의의。
This paper briefly expounds the near-field diffraction theory of small aperture, and focuses on computer numerical simulation of light intensity space distribution in diffraction field while incident light is monochromatic and vertical. Based on simulation and analysis of light intensity in different radius apertures diffraction field, the paper gets the light intensity space distribution characteristics which has theoretic guiding significance for proximity exposure technical parameters.
