电脑知识与技术
電腦知識與技術
전뇌지식여기술
COMPUTER KNOWLEDGE AND TECHNOLOGY
2014年
9期
2107-2109
,共3页
磁控溅射%电阻率%透过率%AZO%薄膜
磁控濺射%電阻率%透過率%AZO%薄膜
자공천사%전조솔%투과솔%AZO%박막
magnetron sputtering%resistivities%transmittance%AZO%films
利用直流磁控溅射法,采用氧化锌铝(98%ZnO+2%Al2O3)为靶材,在普通载玻片上制备了AZO (ZnO:Al)薄膜。采用X射线衍射仪、场扫描电镜对薄膜的结构及表面形貌进行了分析,采用分光光度计和四探针法对薄膜的光电学性能进行了测试。结果表明:控制好工艺参数可以制备出致密、均匀并具有良好的光电性能的AZO薄膜;并计算了带隙能量和折射率。
利用直流磁控濺射法,採用氧化鋅鋁(98%ZnO+2%Al2O3)為靶材,在普通載玻片上製備瞭AZO (ZnO:Al)薄膜。採用X射線衍射儀、場掃描電鏡對薄膜的結構及錶麵形貌進行瞭分析,採用分光光度計和四探針法對薄膜的光電學性能進行瞭測試。結果錶明:控製好工藝參數可以製備齣緻密、均勻併具有良好的光電性能的AZO薄膜;併計算瞭帶隙能量和摺射率。
이용직류자공천사법,채용양화자려(98%ZnO+2%Al2O3)위파재,재보통재파편상제비료AZO (ZnO:Al)박막。채용X사선연사의、장소묘전경대박막적결구급표면형모진행료분석,채용분광광도계화사탐침법대박막적광전학성능진행료측시。결과표명:공제호공예삼수가이제비출치밀、균균병구유량호적광전성능적AZO박막;병계산료대극능량화절사솔。
AZO ( ZnO:Al) films were prepared on the glass substrate through the DC magnetron sputtering with the target of (98%ZnO+2%Al2O3). The structure morphology and optical and electronical properties of the AZO films were investigated by XRD, SEM, UV-visble spectrophotometry and four-point probe method. Experimental results indicate that a dense and even AZO film with better optical and electronical properties could be prepared by the regulation of processing parameter;gap-band energy and refractive index were calculated.