光谱学与光谱分析
光譜學與光譜分析
광보학여광보분석
SPECTROSCOPY AND SPECTRAL ANALYSIS
2013年
12期
3197-3201
,共5页
谢宁%马凯迪%沈异凡%王倩
謝寧%馬凱迪%瀋異凡%王倩
사저%마개적%침이범%왕천
纳米多孔氧化铝薄膜%光致发光%发光中心%退火%光谱分析
納米多孔氧化鋁薄膜%光緻髮光%髮光中心%退火%光譜分析
납미다공양화려박막%광치발광%발광중심%퇴화%광보분석
Nanoporous alumina films%Photoluminescence%Luminescence center%Annealing%Spectral analysis
以草酸为电解液,采用二次阳极氧化法制备出了纳米多孔氧化铝薄膜,经不同退火温度和退火气氛处理氧化铝薄膜后,通过分析其光致发光光谱得出:相同的退火气氛中,退火温度 T≤600℃时, T=500℃具有最大的光致发光强度;退火温度 T≥700℃时,随着退火温度的升高,样品的发光强度增大。在不同的退火气氛中,多孔氧化铝薄膜随着退火温度的升高,发光峰位改变不同,即在空气中退火处理后,随着退火温度的升高,发光峰位蓝移,而在真空中退火处理后,发光峰位并不随退火温度的升高而变化;通过对1100℃高温退火处理后的氧化铝薄膜的光致发光曲线的高斯拟合,可以看出,经退火处理后的多孔氧化铝,主要存在三个发光中心,发光曲线在350~600 nm范围内对应三个发射峰,发射波长分别为387,410,439 nm。相同的退火温度下,空气中退火得到的氧化铝薄膜的光致发光强度大于真空中退火处理后的氧化铝薄膜。基于实验结果,结合X射线色散能谱(EDS )、红外反射光谱等表征手段,探讨了多孔氧化铝薄膜的发光机制,并对经过不同退火条件得到的多孔氧化铝薄膜的光致发光特性的改变做出了合理的解释。
以草痠為電解液,採用二次暘極氧化法製備齣瞭納米多孔氧化鋁薄膜,經不同退火溫度和退火氣氛處理氧化鋁薄膜後,通過分析其光緻髮光光譜得齣:相同的退火氣氛中,退火溫度 T≤600℃時, T=500℃具有最大的光緻髮光彊度;退火溫度 T≥700℃時,隨著退火溫度的升高,樣品的髮光彊度增大。在不同的退火氣氛中,多孔氧化鋁薄膜隨著退火溫度的升高,髮光峰位改變不同,即在空氣中退火處理後,隨著退火溫度的升高,髮光峰位藍移,而在真空中退火處理後,髮光峰位併不隨退火溫度的升高而變化;通過對1100℃高溫退火處理後的氧化鋁薄膜的光緻髮光麯線的高斯擬閤,可以看齣,經退火處理後的多孔氧化鋁,主要存在三箇髮光中心,髮光麯線在350~600 nm範圍內對應三箇髮射峰,髮射波長分彆為387,410,439 nm。相同的退火溫度下,空氣中退火得到的氧化鋁薄膜的光緻髮光彊度大于真空中退火處理後的氧化鋁薄膜。基于實驗結果,結閤X射線色散能譜(EDS )、紅外反射光譜等錶徵手段,探討瞭多孔氧化鋁薄膜的髮光機製,併對經過不同退火條件得到的多孔氧化鋁薄膜的光緻髮光特性的改變做齣瞭閤理的解釋。
이초산위전해액,채용이차양겁양화법제비출료납미다공양화려박막,경불동퇴화온도화퇴화기분처리양화려박막후,통과분석기광치발광광보득출:상동적퇴화기분중,퇴화온도 T≤600℃시, T=500℃구유최대적광치발광강도;퇴화온도 T≥700℃시,수착퇴화온도적승고,양품적발광강도증대。재불동적퇴화기분중,다공양화려박막수착퇴화온도적승고,발광봉위개변불동,즉재공기중퇴화처리후,수착퇴화온도적승고,발광봉위람이,이재진공중퇴화처리후,발광봉위병불수퇴화온도적승고이변화;통과대1100℃고온퇴화처리후적양화려박막적광치발광곡선적고사의합,가이간출,경퇴화처리후적다공양화려,주요존재삼개발광중심,발광곡선재350~600 nm범위내대응삼개발사봉,발사파장분별위387,410,439 nm。상동적퇴화온도하,공기중퇴화득도적양화려박막적광치발광강도대우진공중퇴화처리후적양화려박막。기우실험결과,결합X사선색산능보(EDS )、홍외반사광보등표정수단,탐토료다공양화려박막적발광궤제,병대경과불동퇴화조건득도적다공양화려박막적광치발광특성적개변주출료합리적해석。
The nanoporous alumina films were prepared by two-step anodic oxidation in 0.5 mol · L -1 oxalic acid electrolyte at 40 V .Photoluminescence (PL ) of nanoporous alumina films was investigated under different annealing atmosphere and different temperature .The authors got three results about the PL measurements .In the same annealing atmosphere ,when the annealling temperature T≤600 ℃ ,the intensity of the PL peak increases with elevated annealing temperature and reaches a maximum value at 500 ℃ ,but the intensity decreases with a further increase in the annealing temperature ,and the PL peak intensity of samples increases with the increase in the annealing temperature when the annealling temperature T≥800 ℃ .In the different annealling atmosphere ,the change in the photoluminescence peak position for nanoporous alumina films with the increase in the annealing temperature is different :With the increase in the annealling temperature ,the PL peak position for the samples annealed in air at-mosphere is blue shifted ,while the PL peak position for the samples annealed in vacuum atmosphere will not change .The PL spectra of nanoporous alumina films annealed at 1 100 ℃ in air atmosphere can be de-convoluted by three Gaussian components at an excitation wavelength of 350 nm ,with bands centered at 387 ,410 and 439 nm ,respectively .These results suggest that there might be three luminescence centers for the PL of annealed alumina films .At the same annealling temperature ,the PL peak in-tensity of samples annealed in air atmosphere is stronger than that annealed in the vacuum .Based on the experimental results and the X-ray dispersive energy spectrum (EDS) combined with infrared reflect spectra ,the luminescence mechanisms of nanoporous alumina films are discussed .There are three luminescence centers in the annealed nanoporous alumina films ,which originate from the F center ,F+ center and the center associated with the oxalic impurities .The effects of different annealing conditions on the photoluminescence of nanoporous alumina film are reasonably explained .