CAJ | 학술논문

分别使用传统喷射电沉积和摩擦辅助喷射电沉积技术制备一组不同沉积时间的镍沉积层，并采用非接触式表面三维形貌仪对其表面形貌进行观察，采用XRD分析沉积层的晶粒大小和织构随沉积时间的变化，用TEM观察沉积层组织机构的不同，通过沉积层的厚度分析对两种方法的沉积效率和稳定性进行比较。结果表明：传统喷射电沉积镍层随着沉积时间的增加表面逐渐变得粗糙，沉积时间由20 min增加至120 min时，粗糙度Ra值由212 nm增加至282 nm，而摩擦辅助喷射电沉积镍层可以始终保持光亮平整，Ra值由最初的228 nm逐渐减小，并最终稳定在171 nm左右；摩擦辅助装置的加入对喷射电沉积效率影响很小，但使沉积的均匀性和稳定性得以提高；同时，该装置细化晶粒，使平均晶粒大小由15.6 nm减少至10.9 nm。
분별사용전통분사전침적화마찰보조분사전침적기술제비일조불동침적시간적얼침적층，병채용비접촉식표면삼유형모의대기표면형모진행관찰，채용XRD분석침적층적정립대소화직구수침적시간적변화，용TEM관찰침적층조직궤구적불동，통과침적층적후도분석대량충방법적침적효솔화은정성진행비교。결과표명：전통분사전침적얼층수착침적시간적증가표면축점변득조조，침적시간유20 min증가지120 min시，조조도Ra치유212 nm증가지282 nm，이마찰보조분사전침적얼층가이시종보지광량평정，Ra치유최초적228 nm축점감소，병최종은정재171 nm좌우；마찰보조장치적가입대분사전침적효솔영향흔소，단사침적적균균성화은정성득이제고；동시，해장치세화정립，사평균정립대소유15.6 nm감소지10.9 nm。
Nickel deposition layers were prepared by traditional jet electrodeposition and the new friction aided jet electrodeposition technique, respectively. Their surface micrograph,diameter of crystal grain and organizational structure were studied by non-contact three-dimensional surface topography instrument, XRD and TEM. The deposition efficiency and stability of the two methods were compared through thickness analysis of the deposition layers. The results show that the surface of traditional jet electrodeposited nickel layer gradually becomes rough with the deposition time increasing from 20 min to 120 min and Ra increasing from 212 nm to 282 nm. Contrarily, the friction aided jet electrodeposited nickel layer can always maintain bright and smooth, and Ra decreases from 228 nm to 171 nm. By friction aided device, little effect happens on the efficiency of jet electrodeposition, but the deposition uniformity and stability can be improved. And by the device, the average grain size decreases from 15.6 nm to 10.9 nm.