化学工程
化學工程
화학공정
CHEMICAL ENGINEERING
2014年
6期
15-18
,共4页
刘瑞聪%汤培平%林康英%刘碧华%游淳毅%王泉
劉瑞聰%湯培平%林康英%劉碧華%遊淳毅%王泉
류서총%탕배평%림강영%류벽화%유순의%왕천
太阳能硅%冶金级硅%湿法冶金
太暘能硅%冶金級硅%濕法冶金
태양능규%야금급규%습법야금
solar-grade silicon%metallurgical-grade silicon%hydrometallurgy
采用盐酸和氢氟酸两步法湿法提纯制备太阳能级多晶硅,当工艺条件为w(HCl)=8%,w(HF)=6%,可使铁中杂质质量分数降到26×10-6,去除率达到99.1%;铝中杂质质量分数降低到60×10-6,去除率为82.3%。分析和讨论了酸浸过程中硅晶体的形貌和结构的变化。FESEM图像表明杂质在硅的表面呈现集中链状分布,晶粒沿着高应力和缺陷区直线式分裂;XRD数据显示,在反应过程中,杂质的析出对硅晶格结构的影响有限,晶格因温度增加、应力不平衡等因素反而呈现膨胀的趋势。研究和分析湿法冶金中硅晶体结构和形貌的变化,对于了解酸浸过程反应机理,提高湿法提纯的除杂效率,优化太阳能级硅生产工艺具有重要意义。
採用鹽痠和氫氟痠兩步法濕法提純製備太暘能級多晶硅,噹工藝條件為w(HCl)=8%,w(HF)=6%,可使鐵中雜質質量分數降到26×10-6,去除率達到99.1%;鋁中雜質質量分數降低到60×10-6,去除率為82.3%。分析和討論瞭痠浸過程中硅晶體的形貌和結構的變化。FESEM圖像錶明雜質在硅的錶麵呈現集中鏈狀分佈,晶粒沿著高應力和缺陷區直線式分裂;XRD數據顯示,在反應過程中,雜質的析齣對硅晶格結構的影響有限,晶格因溫度增加、應力不平衡等因素反而呈現膨脹的趨勢。研究和分析濕法冶金中硅晶體結構和形貌的變化,對于瞭解痠浸過程反應機理,提高濕法提純的除雜效率,優化太暘能級硅生產工藝具有重要意義。
채용염산화경불산량보법습법제순제비태양능급다정규,당공예조건위w(HCl)=8%,w(HF)=6%,가사철중잡질질량분수강도26×10-6,거제솔체도99.1%;려중잡질질량분수강저도60×10-6,거제솔위82.3%。분석화토론료산침과정중규정체적형모화결구적변화。FESEM도상표명잡질재규적표면정현집중련상분포,정립연착고응력화결함구직선식분렬;XRD수거현시,재반응과정중,잡질적석출대규정격결구적영향유한,정격인온도증가、응력불평형등인소반이정현팽창적추세。연구화분석습법야금중규정체결구화형모적변화,대우료해산침과정반응궤리,제고습법제순적제잡효솔,우화태양능급규생산공예구유중요의의。
Using hydrochloric acid and hydrofluoric acid as leaching agents,a two-step method was introduced to prepare solar-grade silicon through hydrometallurgical route.The result shows that when the silicon powder is leached at appropriate condition of w(HCl)=8%,w(HF)=6%,the impurities mass fraction of Fe is reduced to 26 ×1 0-6 , with the removal rate of 99.1%;the impurities mass fraction of Al is reduced to 60 ×1 0-6 ,with the removal rate of 82.3%.The changes in the morphology and crystalline structure of Si during the leaching process were discussed. The images of FESEM show that the impurities are in line-like centralized distribution on the surface of Si crystal. The crystalline grain splits directly along the area where the stress is strong and which contains numerous defects. XRD data indicate that the impurities dissolved out of Si have little effect on the crystalline structure,whereas the crystal expands as a result of temperature rise and unbalance of stress.Analyzing the variation of morphology and crystalline structure of silicon is of great importance to understand the mechanism of leaching process,improve the purification efficiency and optimize the industrialized technology for preparing solar-grade silicon.