CAJ | 학술논문

针对目前关于退火温度对原子层沉积法（ALD）制备ZnMgO薄膜晶体结构和光学性质影响鲜有报道的现象，进行了相应的实验研究分析。采用ALD在石英衬底上制备ZnMgO合金薄膜，对制得的样品在空气中进行不同温度的退火处理。利用X射线多晶衍射仪（XRD）、光致发光谱（PL）和紫外可见（UV-Vis）吸收光谱测试，系统的分析了不同退火温度对ALD法制备ZnMgO薄膜晶体结构和光学性能的影响。XRD测试结果表明：退火温度为600℃时，薄膜的晶体质量得到改善，且（100）衍射峰的强度明显增强。结合PL和UV-Vis吸收光谱的测试分析得出：退火温度为600℃时，能明显促进薄膜中Mg组分的增加使薄膜的禁带宽度进一步增大。从而说明适当温度的退火处理可有效的改善ZnM gO薄膜的晶体质量及光学特性。
침대목전관우퇴화온도대원자층침적법（ALD）제비ZnMgO박막정체결구화광학성질영향선유보도적현상，진행료상응적실험연구분석。채용ALD재석영츤저상제비ZnMgO합금박막，대제득적양품재공기중진행불동온도적퇴화처리。이용X사선다정연사의（XRD）、광치발광보（PL）화자외가견（UV-Vis）흡수광보측시，계통적분석료불동퇴화온도대ALD법제비ZnMgO박막정체결구화광학성능적영향。XRD측시결과표명：퇴화온도위600℃시，박막적정체질량득도개선，차（100）연사봉적강도명현증강。결합PL화UV-Vis흡수광보적측시분석득출：퇴화온도위600℃시，능명현촉진박막중Mg조분적증가사박막적금대관도진일보증대。종이설명괄당온도적퇴화처리가유효적개선ZnM gO박막적정체질량급광학특성。
In the present paper ,we report the research on the effects of annealing temperature on the crystal quality and optical properties of ZnMgO films deposited by atom layer deposition (ALD) .ZnMgO films were prepared on quartz substrates by ALD and then some of the samples were treated in air ambient at different annealing temperature .The effects of annealing temperature on the crystal quality and optical properties of ZnMgO films were characterized by X-ray diffraction (XRD) ,photoluminescence (PL) and ultraviolet-visible (UV-Vis) absorption spectra .The XRD results showed that the crystal quality of ZnMgO films was significantly improved when the annealing temperature was 600 ℃ ,meanwhile the intensity of (100)diffraction peak was the strongest .Combination of PL and UV-Vis absorption measurements showed that it can strongly promote the Mg content increas-ing in ZnMgO films and increase the band gap of films .So the results illustrate that suitable annealing temperature can effectively improve the crystal quality and optical properties of ZnMgO films .