CAJ | 학술논문

介绍了叠层紫外/红外双色探测器结构特点、工作原理及选择CdS晶体材料制作紫外探测器光敏元的理论依据。阐述了 CdS 晶片制备及表面抛光质量的重要性和必要性。针对磨抛工艺对 CdS紫外探测器性能的影响进行了研究。对比了几种抛光液对晶片表面的抛光效果，并进行了扫描电镜、红外透过率和表面粗糙度分析，得到了抛光后晶片表面的扫描电子显微镜（SEM）照片和CdS晶片厚度与红外透过率的关系曲线及CdS晶片厚度与振动噪声的关系。通过理论和实践的结合，确定了最佳抛光材料及最佳晶片厚度，研制出了完全能满足紫外探测器工艺要求的CdS探测器晶片。
개소료첩층자외/홍외쌍색탐측기결구특점、공작원리급선택CdS정체재료제작자외탐측기광민원적이론의거。천술료 CdS 정편제비급표면포광질량적중요성화필요성。침대마포공예대 CdS자외탐측기성능적영향진행료연구。대비료궤충포광액대정편표면적포광효과，병진행료소묘전경、홍외투과솔화표면조조도분석，득도료포광후정편표면적소묘전자현미경（SEM）조편화CdS정편후도여홍외투과솔적관계곡선급CdS정편후도여진동조성적관계。통과이론화실천적결합，학정료최가포광재료급최가정편후도，연제출료완전능만족자외탐측기공예요구적CdS탐측기정편。
This paper introduces the UV/IR detector structure characteristics, working principle, the theory basis of selecting cadmium sulfide for UV detector. The importance and necessity of selecting cadmium surface polishing quality were presented. The emphasis on the fabrication technology of CdS wafer of the mechanical lapping and polishing was described in details. The best polishing liquid and thickness of the CdS was achieved by comparing and analyzing the surface of wafers SEM photos, infrared transmission and roughness, which were lapped and polished by several polishing liquid.