CAJ | 학술논문

对比了用不同镀制工艺方式镀制的Ni80Cr20膜中性密度滤光片的中性度特性，溅射工艺镀制的密度片中性度值3.7%，远好于电子枪蒸发和电阻蒸发镀制结果(15%)。采用相平衡理论，模拟计算了的热蒸发镀制的镍铬合金膜的蒸发速率，铬相比镍含量偏高2.8倍，导致了膜层中合金含量相对膜料出现较大差异，导致中性密度滤光片光谱中性度的下降。使用蔡司SUPRA35扫描电镜和牛津EDS能谱仪分别测试了溅射工艺和热蒸发工艺镀制的密度滤光片的镍铬含量，测试结果与模拟分析结论基本一致。
대비료용불동도제공예방식도제적Ni80Cr20막중성밀도려광편적중성도특성，천사공예도제적밀도편중성도치3.7%，원호우전자창증발화전조증발도제결과(15%)。채용상평형이론，모의계산료적열증발도제적얼락합금막적증발속솔，락상비얼함량편고2.8배，도치료막층중합금함량상대막료출현교대차이，도치중성밀도려광편광보중성도적하강。사용채사SUPRA35소묘전경화우진EDS능보의분별측시료천사공예화열증발공예도제적밀도려광편적얼락함량，측시결과여모의분석결론기본일치。
Compare the density neutrality of Neutral Density (ND) filter coated with different coating process when the coating material is Ni80-Cr20. The density neutrality value is 3.7% when the filter coated with magnetron sputtering technical, and the value is better than that of coated with Electronic Beam(EB) evaporation or resistance evaporation process, which valued 15%. Based on phase equilibrium theory, the reason why neutrality was reduced when coating Ni-Cr alloy under EB and resistance coatings were simulated and analyzed. At first of evaporation process, Cr is 2.8 times more than Ni, which causes density neutrality reduced. To certificate the analyzed results, Ni and Cr determination in both magnetron sputtering coating and resistance evaporation process were tested by Zeiss SEM and Oxford EDS. The experimental data is similar to theoretical results.