真空与低温
真空與低溫
진공여저온
VACUUM AND CRYOGENICS
2014年
4期
201-208
,共8页
游志恒%满卫东%涂昕%阳朔
遊誌恆%滿衛東%塗昕%暘朔
유지항%만위동%도흔%양삭
石墨烯%制备%微波等离子体化学气相沉积%研究进展
石墨烯%製備%微波等離子體化學氣相沉積%研究進展
석묵희%제비%미파등리자체화학기상침적%연구진전
grephene%preparation%MPCVD%research progress
微波等离子体化学气相沉积(MPCVD)法是近年来发展起来的制备石墨烯的新方法,具有低温生长、基底材料选择广泛、容易掺杂等优点,逐渐成为制备高质量石墨烯的主要方法。首先通过分析制备石墨烯的几种主要方法(微机械剥离法、SiC外延生长法、化学剥离法、化学气相沉积法)得出MPCVD法相对于其他方法的优势,然后综述了MPCVD法制备石墨烯的研究进展,最后简要列举了MPCVD法制备的石墨烯的应用并对MPCVD法制备石墨烯的发展趋势进行了展望。
微波等離子體化學氣相沉積(MPCVD)法是近年來髮展起來的製備石墨烯的新方法,具有低溫生長、基底材料選擇廣汎、容易摻雜等優點,逐漸成為製備高質量石墨烯的主要方法。首先通過分析製備石墨烯的幾種主要方法(微機械剝離法、SiC外延生長法、化學剝離法、化學氣相沉積法)得齣MPCVD法相對于其他方法的優勢,然後綜述瞭MPCVD法製備石墨烯的研究進展,最後簡要列舉瞭MPCVD法製備的石墨烯的應用併對MPCVD法製備石墨烯的髮展趨勢進行瞭展望。
미파등리자체화학기상침적(MPCVD)법시근년래발전기래적제비석묵희적신방법,구유저온생장、기저재료선택엄범、용역참잡등우점,축점성위제비고질량석묵희적주요방법。수선통과분석제비석묵희적궤충주요방법(미궤계박리법、SiC외연생장법、화학박리법、화학기상침적법)득출MPCVD법상대우기타방법적우세,연후종술료MPCVD법제비석묵희적연구진전,최후간요열거료MPCVD법제비적석묵희적응용병대MPCVD법제비석묵희적발전추세진행료전망。
In recent years,microwave plasma chemical vapor deposition(MPCVD) has been developed as a new method to prepare graphene. With the advantages of low-temperature growth,a wide choice of substrate material,and dop-ing easy,MPCVD gradually becomes the main method for preparation of high-quality graphene. Firstly,several main methods(micro-mechanical peeling,SiC epitaxial growth,chemical stripping,and chemical vapor deposition)for synthe-sizing graphene were analysed and compared with MPCVD,finding that MPCVD has clear superiority. Moreover,re-search progress of MPCVD graphene was overviewed. Lastly,the applications of MPCVD graphene were listed briefly and the development trend of it was previewed.