CAJ | 학술논문

综述了MOCVD技术制备抗氧化铱涂层的基本原理和特点；MOCVD的制备工艺，如MO源、基体种类、沉积温度、沉积气氛等对铱涂层结构的影响；提出了铱涂层因热膨胀系数不匹配、存在杂质和微裂纹等氧化活性点失效的3种失效机制；并通过对比国内外MOCVD铱涂层的制备技术及性能特点，指出了国内MOCVD制备铱涂层的过程中存在的成本昂贵、沉积理论不完善、结合力差等关键问题及可能的解决方案。
종술료MOCVD기술제비항양화의도층적기본원리화특점；MOCVD적제비공예，여MO원、기체충류、침적온도、침적기분등대의도층결구적영향；제출료의도층인열팽창계수불필배、존재잡질화미렬문등양화활성점실효적3충실효궤제；병통과대비국내외MOCVD의도층적제비기술급성능특점，지출료국내MOCVD제비의도층적과정중존재적성본앙귀、침적이론불완선、결합력차등관건문제급가능적해결방안。
The basic theory and characteristics of MOCVD technology of fabricating Ir coating were summarized.Factors affect-ing the MOCVD deposition process of Ir coating were introduced,including metal organic precursor,the type of substrate, deposition temperature and atmosphere.Three failure mechanism of Ir coating including coefficient of thermal expansion mismatch,impurities and micro-cracks were summarized and evaluated.Finally,the fabrication of Ir coating by MOCVD at home and abroad were com-pared and the expensive,imperfect theory and poor bonding problem at home was pointed out while the possible route was put for-ward.