功能材料
功能材料
공능재료
JOURNAL OF FUNCTIONAL MATERIALS
2014年
17期
17149-17152
,共4页
樊金波%陈云贵%唐永柏%巫江虹%雷小波%郑洪燕
樊金波%陳雲貴%唐永柏%巫江虹%雷小波%鄭洪燕
번금파%진운귀%당영백%무강홍%뢰소파%정홍연
Gd%磁制冷%置换镀镍%耐蚀性
Gd%磁製冷%置換鍍鎳%耐蝕性
Gd%자제랭%치환도얼%내식성
Gd%magnetic refrigeration%replacement nickel%corrosion resistance
采用置换镀镍的方法,在磁制冷材料 Gd 的表面沉积一层薄膜,并利用光学显微镜(OM)、X 射线衍射仪(XRD)、扫描电子显微镜(SEM)以及能谱仪(EDS)对镀层的形貌、结构、厚度等进行分析表征.结果表明,镀层组织为单一的 Ni 薄膜,厚度大约为15μm.另外,通过测量动电位极化曲线和失重实验对比研究镀镍前后材料在去离子水中的腐蚀性能,结果表明,材料的腐蚀电位从-0.9247 V 提高至-0.7784 V,腐蚀电流密度从0.0019 mA/cm2略微减小到0.00057 mA/cm2,镀镍后的材料相比纯 Gd 的平均腐蚀速率降低了约3.5倍.
採用置換鍍鎳的方法,在磁製冷材料 Gd 的錶麵沉積一層薄膜,併利用光學顯微鏡(OM)、X 射線衍射儀(XRD)、掃描電子顯微鏡(SEM)以及能譜儀(EDS)對鍍層的形貌、結構、厚度等進行分析錶徵.結果錶明,鍍層組織為單一的 Ni 薄膜,厚度大約為15μm.另外,通過測量動電位極化麯線和失重實驗對比研究鍍鎳前後材料在去離子水中的腐蝕性能,結果錶明,材料的腐蝕電位從-0.9247 V 提高至-0.7784 V,腐蝕電流密度從0.0019 mA/cm2略微減小到0.00057 mA/cm2,鍍鎳後的材料相比純 Gd 的平均腐蝕速率降低瞭約3.5倍.
채용치환도얼적방법,재자제랭재료 Gd 적표면침적일층박막,병이용광학현미경(OM)、X 사선연사의(XRD)、소묘전자현미경(SEM)이급능보의(EDS)대도층적형모、결구、후도등진행분석표정.결과표명,도층조직위단일적 Ni 박막,후도대약위15μm.령외,통과측량동전위겁화곡선화실중실험대비연구도얼전후재료재거리자수중적부식성능,결과표명,재료적부식전위종-0.9247 V 제고지-0.7784 V,부식전류밀도종0.0019 mA/cm2략미감소도0.00057 mA/cm2,도얼후적재료상비순 Gd 적평균부식속솔강저료약3.5배.
Replacement process has been used on the surface of Gd to form a layer of film-nickel,and the struc-ture and thickness has been analyzed by using optical microscope (OM),X-ray diffraction (XRD),scanning electron microscope (SEM)and energy spectrometer (EDS).The result shows that the coating organization of the film was single with the thickness about 15 μm.In addition,by measuring the potentiodynamic polarization curves and weightlessness experiment before and after the plating nickel materials in deionized water corrosion performance,the results show that the material after the plating nickel of corrosion potential increased from 0.9247 to 0.7784 V,the corrosion current density of 0.001 9 mA/cm2 slightly reduce to 0.00057 mA/cm2 .Com-pared with the pure Gd,the average corrosion rate was reduced by 3.5 times after nickel plating.