CAJ | 학술논문

在钆表面磁控溅射 Y 薄膜后真空退火,使Gd 基体中的 N、O 等间隙杂质扩散到 Y 薄膜中进而去除基体金属中 N、O 等气体杂质.该方法对去除间隙杂质效果明显,钆中 N、O 浓度显著降低,钆中 O、N浓度分别由1．87×10-4和9．7×10-5降为5．5×10-5,3．3×10-5.具体除杂量与其初始浓度和退火温度及时间有关,所得高纯钆用氧氮分析仪测量 O 含量,并对实验过程及结果进行讨论.
재구표면자공천사 Y 박막후진공퇴화,사Gd 기체중적 N、O 등간극잡질확산도 Y 박막중진이거제기체금속중 N、O 등기체잡질.해방법대거제간극잡질효과명현,구중 N、O 농도현저강저,구중 O、N농도분별유1．87×10-4화9．7×10-5강위5．5×10-5,3．3×10-5.구체제잡량여기초시농도화퇴화온도급시간유관,소득고순구용양담분석의측량 O 함량,병대실험과정급결과진행토론.
A novel two-step purification of Gd was devised.Y was deposited on the free surface of Gd samples by magnetron sputtering,and the deposited samples were subsequently annealed to diffuse oxygen and nitrogen from the Gd bulk to the Y coating layer.Due to the different annealing temperature,the removal degree of oxy-gen and nitrogen was different.In addition,it was found that each removal degree was attributable to a differen-tial refining effect caused by the difference of initial impurity concentration.The trace oxygen and nitrogen as analyzed by O-N analyzer reduced from 1.89×10 -4 ,9.7×10 -5 for raw Gd to 5.5 ×10 -5 ,3.3×10 -5 .The differ-ent process parameters were optimized and the analysis results were discussed.