CAJ | 학술논문

以硫酸铜-乳酸体系为电解液，采用电化学法制备Cu2 O，分别探讨了表面活性剂浓度、CuSO4浓度、溶液pH值、沉积电压、温度、添加剂等工艺参数对Cu2 O形貌结构和尺寸的影响，并通过X射线衍射分析仪和扫描电镜等对Cu2 O进行表征测试。试验结果表明：CTAB在一定范围内可以起到抑制晶体（200）面生长而促进（111）面择优生长的作用；随着CuSO4浓度的增大，Cu2 O晶型由锥型向方型过渡；随着溶液pH值（8、10、12）的增大，Cu2 O晶型由缺角立方晶型经过立方晶型向棱锥型转变；沉积电压的改变对Cu2 O的择优生长晶面有影响，在2.0 V时晶体尺寸最大；随着溶液温度的提高，晶体尺寸呈先增后减的趋势，当温度为60℃时，晶体粒径最大；加入浓度为2.000 mol／L的NaCl添加剂，Cu2 O呈现出二十四面体晶型结构。
이류산동-유산체계위전해액，채용전화학법제비Cu2 O，분별탐토료표면활성제농도、CuSO4농도、용액pH치、침적전압、온도、첨가제등공예삼수대Cu2 O형모결구화척촌적영향，병통과X사선연사분석의화소묘전경등대Cu2 O진행표정측시。시험결과표명：CTAB재일정범위내가이기도억제정체（200）면생장이촉진（111）면택우생장적작용；수착CuSO4농도적증대，Cu2 O정형유추형향방형과도；수착용액pH치（8、10、12）적증대，Cu2 O정형유결각립방정형경과립방정형향릉추형전변；침적전압적개변대Cu2 O적택우생장정면유영향，재2.0 V시정체척촌최대；수착용액온도적제고，정체척촌정선증후감적추세，당온도위60℃시，정체립경최대；가입농도위2.000 mol／L적NaCl첨가제，Cu2 O정현출이십사면체정형결구。
The system of copper sulfate-lactic acid is used as the electrolyte to prepare Cu2 O via electrochemical method and to explore the effects of surfactant (CTAB)concentrations,CuSO4concentrations,solution pH, deposition voltage,reaction temperature and additives on the morphologies and sizes of Cu2 O,respectively. And the structres and properties of Cu2O were analyzed and by X-ray diffraction (XRD)and SEMcharacterized respectively.The results indicate that CTAB can promote the growth of the surface of (1 1 1 ),but induce the growth of the surface of (200).The crystal form of Cu2 O gradually develops into square from taper with the in-crease of CuSO4 concention.The crystal form of Cu2 O gradually develops into pyramid shape from cubic crystal type,which is from missing angle cubic crystal type,with the increase of the solution pH.The deposition volt-age can influence the preferred plane to a certain extent,and the crystal maximum size is reached when deposi-tion voltage is 2.0 V.The Cu2 O crystal size firstly increases and then decreases with the increase of the solution temperature.The crystal size is maximum when the solution temperature is 60 ℃.The crystal structre of Cu2O presents tetrahexahedron type when 2.000 mol/L NaCl added.