CAJ | 학술논문

采用钛宝石飞秒脉冲激光对单晶硅在空气中进行辐照,研究了硅表面在不同扫描速度和能量密度下的光致荧光特性。光致荧光谱(PL)测量表明,在样品没有退火处理的情况下,激光扫描区域观察到橙色荧光峰(603 nm)和红色荧光带(680 nm附近)。扫描电子显微镜(SEM)测量显示,在飞秒脉冲激光辐照硅样品的过程中硅表面沉积了大量的纳米颗粒。利用傅里叶变换红外光谱仪(FT-IR)检测到了低值氧化物 SiOx(x<2)的存在,并且结合能谱仪(EDS)检测结果发现氧元素在光致发光中起着重要作用。研究表明：603 nm处橙色荧光峰来自微构造硅表面低值氧化物 SiOx,680 nm 附近红色荧光带来自量子限制效应。同时样品表面硅纳米颗粒的尺寸和氧元素的浓度分别决定了红色荧光带和橙色荧光的强度,通过调节飞秒激光脉冲的扫描速度和能量密度,可以有效地控制样品的荧光强度。
채용태보석비초맥충격광대단정규재공기중진행복조,연구료규표면재불동소묘속도화능량밀도하적광치형광특성。광치형광보(PL)측량표명,재양품몰유퇴화처리적정황하,격광소묘구역관찰도등색형광봉(603 nm)화홍색형광대(680 nm부근)。소묘전자현미경(SEM)측량현시,재비초맥충격광복조규양품적과정중규표면침적료대량적납미과립。이용부리협변환홍외광보의(FT-IR)검측도료저치양화물 SiOx(x<2)적존재,병차결합능보의(EDS)검측결과발현양원소재광치발광중기착중요작용。연구표명：603 nm처등색형광봉래자미구조규표면저치양화물 SiOx,680 nm 부근홍색형광대래자양자한제효응。동시양품표면규납미과립적척촌화양원소적농도분별결정료홍색형광대화등색형광적강도,통과조절비초격광맥충적소묘속도화능량밀도,가이유효지공제양품적형광강도。
The photoluminescence (PL)from microstructured silicon fabricated by femtosecond laser pul-ses in air was studied.In photoluminescence spectra measurements,the orange PL peak (603 nm)and the red PL band (near 680 nm)were observed even without annealing.The scanning electron microscope images (SEM)revealed that lots of nanoclusters and nanoparticles were deposited on the silicon surface.Fourier trans-form infrared spectroscopy (FT-IR)and energy dispersive spectroscopy (EDS)indicated that the oxygen ele-ment played an important role in the photoluminescence.The results confirmed that the red PL band and the or-ange PL peaks derived from the recombination of the quantum confinement effect and the suboxides (SiOx),re-spectively.Meanwhile,The oxygen content determined the orange PL intensity,and the size of nanoparticles decided the quantum confinement effect.